Development of an Electron Beam Lithography Microfabrication Technique using a Scanning Electron Microscope.

In this work, we present the development of an electron beam lithography (EBL) technique for microfabrication without a beam blanker. With this technique, we have achieved the fabrication of topological arrays of aluminum lines and circles with a maximum resolution of 200 nanometers. This groundbreaking process utilizes a scanning electron microscope (SEM) that is intended solely for imaging purposes. We also demonstrate the ability to create plasmonic topological insulators based on the one- and two-dimensional Su-Schrieffer-Heeger (SSH) model [1]. Our fabrication method is an accessible tool for those wanting to gain experience on a process that is too expensive or unavailable for many.

[1] W. P. Su, J. R. Schrieffer, and A. J. Heeger 1979 Phys. Rev. Lett. 42 1698–701