Machine Learning-Assisted Analysis of Graphene Configurational Tuning and Atomic Patterning
ORAL
Abstract
The remarkable electronic, topological, and structural properties of graphene can be tuned by modifying configurations such as stacking, twist angle, defects, dopants, and strain. Using atomistic modeling and scanning transmission electron microscopy, we have studied the top-down atomic patterning of different dopants in graphene. Our results indicate that vacancy motion in bilayer graphene is constrained, which is supported by both experimental data and first-principles/molecular dynamics studies. Consequently, bilayer graphene emerges as an optimal template for property manipulation via doping. Understanding the relationship between different tuning parameters and desired properties is critical for practical applications of graphene. We used machine learning to predict these properties using high-throughput training datasets. Our study enhances our understanding of graphene’s subtle responses to different modifications.
* This work was supported by the U.S. Department of Energy, Office of Science, Basic Energy Sciences, Materials Sciences and Engineering Division.
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Presenters
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Sinchul Yeom
Oak Ridge National Laboratory
Authors
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Sinchul Yeom
Oak Ridge National Laboratory
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Jack W Villanova
Oak Ridge National Laboratory, Oak Ridge National Lab
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Ondrej Dyck
Oak Ridge National Lab
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Andrew R Lupini
Oak Ridge National Lab
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Stephen Jesse
Oak Ridge National Laboratory, Oak Ridge National Lab
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Mina Yoon
Oak Ridge National Laboratory, Oak Ridge National Lab