Precise patterning of graphene for voltage-tunable Josephson Junctions

ORAL

Abstract

Gate-tunable Josephson junctions provide a promising platform to engineer novel elemental components of superconducting circuits. Particularly, graphene-based weak-link Josephson junctions offer the advantage that the critical current can be easily tuned by the gate voltage. Modifying the dimensions of the graphene can offer another control knob to achieve the desired critical currents. This is important for applications such as gatemons (gate-tunable Josephson junction-based qubits), which have emerged as an alternative approach to mitigate some of the key challenges in superconducting qubits [1]. Here, we explore the use of local anodic oxidation based on atomic force microscopy [2] as part of a clean fabrication process of graphene junctions with a geometry controllable at the submicron scale.

[1] Wang*, Rodan-Legrain* et al. Nat. Nanotech. (2019)

[2] Li, et al. Nano Letters (2018)

* This research was funded in part by the US Army Research Office grant no. W911NF-2210023, by the National Science Foundation QII-TAQS grant no. OMA-1936263, and by the Under Secretary of Defense for Research and Engineering under Air Force Contract No. FA8702-15-D-0001. The views and conclusions contained herein are those of the authors and should not be interpreted as necessarily representing the official policies or endorsements, either expressed or implied, of the U.S. Government. P M-P acknowledges partial support from Fundació Privada Mir-Puig.

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Presenters

  • Pablo M Mercader-Pérez

    Massachusetts Institute of Technology, MIT

Authors

  • Pablo M Mercader-Pérez

    Massachusetts Institute of Technology, MIT

  • Daniel Rodan-Legrain

    Massachusetts Institute of Technology

  • Joel I Wang

    Massachusetts Institute of Technology MI, Massachusetts Institute of Technology

  • Réouven Assouly

    Massachussets Institute of Technology

  • Max Hays

    MIT, Massachusetts Institute of Technology (MIT), Massachusetts Institute of Technology MI, Massachusetts Institute of Technology, Massachussets Institute of Technology, Massachusetts Institute of Technology MIT

  • Aranya Goswami

    Massachusetts Institute of Technology, MIT

  • Sameia Zaman

    Massachusetts Institute of Technology MI, Massachusetts Institute of Technology, Massachusetts Institute of Technology (MIT)

  • Terry P Orlando

    Massachusetts Institute of Technology MIT, Massachusetts Institute of Technology

  • Simon Gustavsson

    Massachusetts Institute of Technology MIT, Massachusetts Institute of Technology

  • Jeffrey A Grover

    Massachusetts Institute of Technology, Massachusetts Institute of Technology (MIT), Massachusetts Institute of Technology MIT

  • Kyle Serniak

    MIT Lincoln Laboratory & MIT RLE

  • Pablo Jarillo-Herrero

    Massachusetts Institute of Technology MI, Massachusetts Institute of Technology MIT, Massachusetts Institute of Technology

  • Pablo Jarillo-Herrero

    Massachusetts Institute of Technology MI, Massachusetts Institute of Technology MIT, Massachusetts Institute of Technology

  • William D Oliver

    Massachusetts Institute of Technology MI, Massachusetts Institute of Technology, Massachusetts Institute of Technology (MIT), Massachusetts Institute of Technology MIT