Intrinsic magnetic topological insulator family, [MnTe][Bi2Te3]n, beyond the bulk limit, via atomic-layer-by-layer epitaxy

ORAL

Abstract

The intrinsic magnetic topological insulator (IMTI) family [MnTe][Bi2Te3]n exhibits varying magneto-topological properties depending on the choice of n. However, conventional bulk crystal growth methods allow only small values of n, with limited magneto-topological properties. To overcome this, we have utilized the atomic layer-by-layer molecular beam epitaxy (MBE) technique, which enables the formation of arbitrary sequences of MnTe and Bi2Te3 by depositing these two components individually, one at a time. With this technique, we have grown IMTIs with n as large as 16, well beyond the reported values via bulk or thin film synthesis. This enables us to observe a transition in magnetic properties from antiferromagnetic to ferromagnetic, and eventually paramagnetic behavior with increase in n. The novel findings presented in this work pave the way for accelerated progress in the exploration of new IMTI phases, unlocking unexplored magneto-topological properties and applications.

* Army Research Office's W911NF2010108 and W911NF2020166

Presenters

  • Deepti Jain

    Rutgers University

Authors

  • Deepti Jain

    Rutgers University

  • Hee Taek Yi

    Rutgers University

  • Matthew Brahlek

    Oak Ridge National Laboratory

  • Myung-Geun Han

    Brookhaven National Laboratory

  • Seongshik Oh

    Rutgers University