micro-focused ARPES study of electronic structure in Janus monolayer transition metal dichalcogenides

ORAL

Abstract

Janus monolayer transition metal dichalcogenides (TMDs) represent a novel class of 2D materials [1,2]. In Janus structures, one side (top or bottom side) of the chalcogen atomic layer within the TMD is substituted with a different chalcogen element. This distinctive configuration induces an out-of-plane electronic polarization, leading to several unique physical properties not observed in usual monolayer TMDs [1]. In our study, we utilized micro-focused angle-resolved photoemission spectroscopy (micro-ARPES)[3] on a Janus monolayer WSeS to examine the modification of the electronic band structure resulting from the substitution of the top selenium atomic layer with sulfur. The Janus monolayer WSeS was synthesized using the plasma treatment [4] on a mechanically exfoliated monolayer WSe2 sample which was specially prepared for micro-ARPES measurement [5], while being continuously monitored with photoluminescence (PL). We successfully obtained the clear ARPES images on both monolayer WSe2 and WSeS. Our results reveal that the substitution of the selenium atomic layer with a sulfur atomic layer results in a momentum shift of the K-valley due to in-plane lattice shrinkage, as well as a notable variation of the band structure around the Γ-point. These observations are basically in good agreement with the first-principles band calculations, indicating the emergence of electronic bands peculiar to the Janus compound.

[1] A.-Y. Lu, et al., Nat. Nanotechnol. 12, 744 (2017).

[2] J. Zhang, et al., ACS Nano 11, 8192 (2017).

[3] M. Kitamura et al., Rev. Sci. Instrum. 93, 033906 (2022).

[4] D. B. Trivedi et al., Adv. Mater. 32, 2006320 (2020).

[5] S. Masubuchi et al., Sci. Rep. 12, 10936 (2022).

* This research was partly supported by a CREST project (Grants No. JP-MJCR15F3, No. JPMJCR16F2, No. JPMJCR18T1, and No. JPMJCR20B4) from the Japan Science and Technology Agency (JST) and Japan Society for the Promotion of Science KAKENHI (Grants-in-Aid for Scienti?c Research) (Grants No. JP20H00127, No. JP20H00354, No. JP20H01834, No. JP21H05232, No. JP21H05233, No. JP21H05234, No. JP21H05235, and No.JP21H05236) and KEK-PF (Proposal No. 2018S2-001, No. 2021S2-001, and No. 2021G141).

Publication: S. Akatsuka, et al., in preparation

Presenters

  • Shunsuke Akatsuka

    Univ of Tokyo

Authors

  • Shunsuke Akatsuka

    Univ of Tokyo

  • Masato Sakano

    Univ of Tokyo

  • Hiroshi Nakajo

    KOKUSAI ELECTRIC CORP.

  • Toshiaki Kato

    Tohoku Univ

  • Naoya Yamaguchi

    Kanazawa Univ

  • Fumiyuki Ishii

    Kanazawa University

  • Takato Yamamoto

    Univ of Tokyo

  • Natsuki Mitsuishi

    RIKEN Center for Emergent Matter Science

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Electronic and Optical Materials, National Institute for Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science

  • Takashi Taniguchi

    Kyoto Univ, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Sciences, NIMS, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science, International Center for Materials Nanoarchitectonics, NIMS, Japan, International Center for Materials Nanoarchitectonics, Tsukuba, National Institue for Materials Science, Kyoto University, National Institute of Materials Science, International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • Miho Kitamura

    Institute for Advanced Synchrotron Light Source, National Institutes for Quantum Science and Technology

  • Koji Horiba

    National Institute for Quantum Science and Technology (QST), Institute for Advanced Synchrotron Light Source, QST

  • Katsuaki Sugawara

    Department of Physics, Graduate School of Science, Tohoku University, Tohoku University

  • Seigo Souma

    Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, Tohoku University

  • Takafumi Sato

    Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, Tohoku University

  • Hiroshi Kumigashira

    Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Tohoku University

  • Yuta Seo

    Institute of Industrial Science, University of Tokyo

  • Satoru Masubuchi

    Univ of Tokyo, Institute of Industrial Science, University of Tokyo

  • Tomoki Machida

    Univ of Tokyo, Institute of Industrial Science, University of Tokyo

  • Kyoko Ishizaka

    Univ of Tokyo, RIKEN, The Univ. of Tokyo, University of Tokyo