Data-driven studies of magnetic van der Waals heterostructures
ORAL
Abstract
We use data-driven approaches to investigate magnetic van der Waals (vdW) heterostructures of the form AB2X4/C2Y3 based on a well-known heterostructure MnBi2Te4/Bi2Te3. A very large number of candidate materials (~107) are considered in the study, which are formed by making chemical substitutions at the atomic sites of MnBi2Te4/Bi2Te3. Exploring this huge number of candidates by density functional theory (DFT) calculations or experiments alone is prohibitive. The use of machine learning is a promising way to efficiently explore this huge chemical space, thereby accelerating materials discovery. A subset of nearly 300 heterostructures is considered for investigation using first-principles simulations. We investigate the thermodynamic, electronic, and magnetic properties of the structures. We also compare the properties of MnBi2Te4-type monolayers with their corresponding heterostructures. Our calculations show that we can enhance the stability of some MnBi2Te4-type monolayers as well as alter their magnetic properties by combining them with non-magnetic Bi2Te3-type monolayers. Finally, machine learning techniques are used to predict the properties of all AB2X4/C2Y3 heterostructures and thus identify promising candidates for novel heterostructures that are chemically stable. Our study aims to discover novel vdW materials that could have applications in spintronics, optoelectronics, and quantum computing.
* This work used the Extreme Science and Engineering Discovery Environment (XSEDE), which is supported by NSF grant number ACI-1548562. We used the resources of the Argonne Leadership Computing Facility, which is a DOE Office of Science User Facility supported under Contract DE-AC02-06CH11357. This material is based upon work supported by the NSF CAREER award under Grant No 2044842.
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Presenters
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Romakanta Bhattarai
Rensselaer Polytechnic Institute
Authors
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Romakanta Bhattarai
Rensselaer Polytechnic Institute
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Peter Minch
Rensselaer Polytechnic Institute
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Trevor David Rhone
Rensselaer Polytechnic Institute