Thermoreflectance-based thermometry of silicon thin films with resonantly enhanced temperature sensitivity

ORAL

Abstract

We demonstrate a thermoreflectance-based thermometry technique with an ultimate temperature resolution of 60 μK in a 2.6 mHz bandwidth. This temperature resolution was achieved using a 532 nm-wavelength probe laser and a ~1 μm-thick silicon transducer film with a thermoreflectance coefficient of -4.7×10-3 K-1 at room temperature. The thermoreflectance sensitivity reported here is over an order-of-magnitude greater than that of metal transducers, and is comparable to the sensitivity of traditional resistance thermometers. Supporting calculations reveal that the enhancement in sensitivity is due to optical interference in the thin film.

* This work was supported by the NSF (2044788) and ONR (4720008832). This work was partially supported by the Wisconsin Center for Semiconductor Thermal Photonics, with funding from the Wisconsin Alumni Research Foundation (WARF) via the Research Forward Initiative. The authors gratefully acknowledge use of facilities and instrumentation at the UW-Madison Wisconsin Centers for Nanoscale Technology (wcnt.wisc.edu) partially supported by the NSF through the University of Wisconsin Materials Research Science and Engineering Center (DMR-1720415).

Presenters

  • Changxing Shi

    University of Wisconsin-Madison

Authors

  • Changxing Shi

    University of Wisconsin-Madison

  • Xinchao Wang

    University of Wisconsin-Madison

  • Qifan Zheng

    University of Wisconsin-Madison

  • Jan Maroske

    University of Wisconsin-Madison

  • Dakotah Thompson

    University of Wisconsin-Madison