Oxygen effects in photopolymerization of liquid acrylate thin films

ORAL

Abstract

Oxygen concentration present during free-radical photopolymerization of liquid photoresist thin films affects polymerization efficiency. In our photoresists, oxygen is both a sensitizer and a quencher, promoting radical formation as well as chain termination. Continuous diffusion of oxygen into the films keeps the oxygen concentrations steady despite oxygen depletion through quenching. We examine how polymerization responds to this complex competition of the oxygen's roles. Here we report our recent results on the effects of oxygen concentration on the polymerization threshold and polymer feature size in liquid photoresist thin films using acrylate monomer mixtures.

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Presenters

  • Sandra A Gutierrez Razo

    Department of Chemistry and Biochemistry, University of Maryland-College Park

Authors

  • Sandra A Gutierrez Razo

    Department of Chemistry and Biochemistry, University of Maryland-College Park

  • Nikolaos Liaros

    University of Maryland, College Park, Department of Chemistry and Biochemistry, University of Maryland-College Park

  • Adam Pranda

    Department of Materials Science and Engineering, University of Maryland-College Park

  • Gottlieb Oehrlein

    Department of Materials Science and Engineering, University of Maryland-College Park, Institute for Research in Electronics and Applied Physics, University of Maryland-Colleg

  • John T Fourkas

    University of Maryland, College Park, Department of Chemistry and Biochemistry, University of Maryland-College Park, Institute for Physical Science and Technology, University of Maryland-College Park, Univ of Maryland-College Park