Optical Properties of Titanium Dioxide and Vanadium Oxide Thin Films

POSTER

Abstract

Titanium dioxide films are deposited from a 99.99\% pure target using magnetron sputter deposition on sapphire substrates at 20 $^o$C and 700 $^o$C. The films were then annealed in an argon/oxygen atmosphere using a rapid thermal processor at 500 $^o$C and 900 $^o$C for 5 minutes. The transmittance, reflectance and absorbance of the films are determined by UV-VIS spectrometer under normal incidence in the spectral range 200 nm $\textendash$ 2500 nm. The direct and indirect bandgaps extracted from these measurements were in the range of 2.7 – 3.3 eV. Additional optical data on these films annealed after deposition as well as electrical resistivity measurements will be presented. The vanadium oxide films were made by first depositing a 200 nm-thick film of vanadium on sapphire substrate at room temperature and annealing the films in an oxygen atmosphere for 15 – 30 min at 700 $^o$C. The optical measurements revealed a low transmission of about 50\% and optical bandgaps of 2.3 $textendash$ 2.6 eV.

Authors

  • Nicholas Borucki

    Department of Physics and Astronomy, Youngstown State University

  • Sage Edwards

    Department of Physics and Astronomy, Youngstown State University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University