Changes in magnetic and electric anisotropy of Co2FeAl Heusler alloy films due to oblique angle deposition

POSTER

Abstract

We will present our studies of the structural, magnetic and transport properties of Co$_{\mathrm{2}}$FeAl Heusler alloy films fabricated by magnetron sputtering-oblique angle deposition. Oblique angle deposition is when the substrate is not placed facing the source of atoms during growth, but is tilted at an angle. Increasing this tilt/glancing angle caused significant changes in the properties of the film making it more porous, where the films grow in isolated nano-pillars rather than being smooth and continuous. This in turn lead to significant changes in magnetic anisotropy, where the coercivity of the films increased dramatically from 30 Oe to 400 Oe, as the deposition angel was increased. The electrical resistivity of the films also increased steeply, especially for angles larger than 60\textdegree.

Authors

  • Zeeshan Ali

    Miami University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University