Crystalline Quality and Surface Roughness Optimization of Hetero-Epitaxial Titanium Nitride on Sapphire.

POSTER

Abstract

In this project we optimized the growth of hetero-epitaxial titanium nitride (TiN) on sapphire using controllably unbalanced reactive magnetron sputtering. TiN is a mechanically-robust, high-temperature stable metallic material; these properties make TiN a material of interest for robust electrodes and resilient plasmonics. We adjusted deposition parameters such as external coil current, temperature, nitrogen/argon ratio, growth time and magnetron power to optimize the crystalline quality and surface morphology of TiN. Post-growth, we measured crystallinity using X-ray diffraction, and surface morphology using atomic force microscopy. X-ray diffraction showed a single TiN peak with pendell\"{o}sung fringes; from these fringes we obtained a film thickness of \textasciitilde 50 nm. Atomic force microscopy showed a surface roughness of \textasciitilde 168 pm. Based on this characterization, we determined that the deposition parameters outlined in this presentation yielded (111)-oriented epitaxial TiN with minimal surface roughness. This optimization is a crucial first step in maximizing TiN's usefulness in the above mentioned applications.

Authors

  • H. A. Smith

    Department of Physics, University of Dayton, Dayton, OH 45469

  • Said Elhamri

    Department of Physics, University of Dayton, Dayton, Ohio, Department of Physics, University of Dayton, Dayton, OH 45469

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University

  • Rudrakant Sollapur

    Miami University, The College of Wooster, University of Dayton, Ohio University and Argonne National Laboratory, Argonne National Laboratory, J. Stefen Inst., Slovenia, Ohio University, Institute of Physics, University of Belgrade, The University of Akron, Faculty of Physics, University of Belgrade, Institute for Multidisciplinary Research, University of Belgrade, Faculty of Sciences, University of Novi Sad, Bowling Green State University, Australian National University, Benet lab, Department of Physics and Electro-Optics Program University of Dayton, Dayton, OH 45469, Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ, Department of Physics, Arizona State University, Tempe, AZ, Electro-Optics Program, University of Dayton, Dayton, OH 45469, Department of Physics and Astronomy, Youngstown State University, University of Memphis, TN, Union College Barbourville, KY, Air Force Research Laboratory, Materials and Manufacturing Directorate, WPAFB, OH, Arizona State University, Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH 45433, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH, Case Western Reserve University, Department of Electrical Engineering and Computer Science, Cleveland, OH, Air Force Research Lab, Materials and Manufacturing Directorate, WPAFB, OH, Ohio Northern Univ, University of Notre Dame, Miami Univ, Leibniz Institute of Photonic Technology e.V.; and Otto Schott Institute of Material Research, Abbe Center of Photonics, Leibniz Institute of Photonic Technology e.V., Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University; and Helmholtz Institute Jena, Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich Schiller University