Modeling the Extreme-Pressure Lubricating Interface

POSTER

Abstract

Extreme-pressure lubricants are currently widely used in various areas of applications. However, despite of their common use, the fundamental aspects of the mechanism in which these lubricants reduce the friction coefficient are not clear yet. Earlier macrotribological experiments using chlorinated hydrocarbons have shown remarkable effectiveness. It has been proven that thin films that resemble those formed under tribological conditions can also be synthesized in ultrahigh vacuum when beams of chlorinated hydrocarbons are directed onto a clean iron surface. Here results obtained using X-ray photoelectron spectroscopy, temperature programmed desorption, atomic force microscopy and microtribological measurements of these films are presented. Substantial information about the fundamental properties and structure of this model lubricating interface is revealed. A mechanism of the formation of the interface under tribological conditions is also suggested.

Authors

  • Matey Kaltchev

    Department of Physics and Chemistry, Milwaukee School of Engineering

  • Feng Gao

    Department of Chemistry, University of Wisconsin Milwaukee

  • Perry Yaney

    Department of Physics, University of Oregon, USAF Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson AFB, Ohio, NHMFL, CRIEPI, UCSD, University of Dayton, L-3 Communications Cincinnati Electronics, University of Georgia, Air Force Research Laboratory, Anteon Corporation, California State University-Chico, The Ohio State University, Univ. Akron, Air Force Institute of Technology, Albion College, Albion, MI 49224, Physics Department, University of Florida, Gainesville, Mound Laser \& Photonics Center, Inc., Hitachi Global Storage Technologies, San Jose, CA 95120, University of Dayton Research Institute, University of South Alabama, Jet Propulsion Laboratory, Anteon, Universidad Michoacana de San Nicolas de Hidalgo, Morelia, Michoac\'{a}n, Mexico, Department of Chemistry, The University of Akron, Department of Physics, The University of Akron, Physics Department and The Future-Chips Constellation, Renssalaer Polytechnic Institute, Local Co-Chair

  • Wilfred Tysoe

    Department of Chemistry, University of Wisconsin Milwaukee