TiO2 Films on Si(111) by Dilute Aqueous Chemical Bath Deposition

Dilute Aqueous Chemical Bath Deposition (CBD) from highly acidic (pH $<$ 1) TiCl$_{3}$ HCl solutions at room temperature and slightly higher (23$^{o}$C -- 40$^{o}$C) produced thin titanium dioxide films on clean Si(111). We report initial results of X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), and X-ray Diffraction (XRD). The films thicknesses varied from 300 nm to $\sim $ 1 $\mu$m. It was found that the films required annealing to ensure adherence to the Si(111) substrate. XRD showed that the rutile structure was present in the TiO$_{2}$.