Geometric patterning with HIM at CNMS

POSTER

Abstract

Electron microscopy is one of the most used analytical techniques available for materials science and nanoscience research. Recent technical advances in these areas have exposed the need for enhanced spatial resolution and depth-of-field. The helium-ion-microscope (HIM) is an instrument designed to answer these and other materials needs. The Center for Nanophase Materials Sciences (CNMS) located at Oak Ridge National Laboratory is commissioning the world's first helium-ion microscope tailored specifically for imaging, nanopatterning, and nanofabrication. In the present survey study, our group sought to develop the parameters necessary to pattern a variety of geometric shapes into single-layer graphene on a SiO$_{2}$ substrate utilizing the HIM at the CNMS. The uses for graphene are still being explored, and as such have become important recently for its use in nanoelectronics. Employing the patterning software in the HIM, we used a combination of dose and dwell time to pattern the graphene. Future studies will seek to refine the patterning process for graphene and other technical relevant materials.

Authors

  • Allison Linn

    Western Kentucky University

  • J.K. Hwang

    Western Kentucky University, University of Pardubice, Francis Marion University, Clemson University Professor, Francis Marion University Professor, Undergraduate Administrator, Oak Ridge National Laboratory, Oak Ridge, Tennessee, Austin Peay State University, University Strenwarte-Muenchen, Seoul National University, Gatton Academy for Science and Mathematics, Alabama A\&M University, Cygnus, Center for Nanophase Materials Science at Oak Ridge National Laboratory, Vanderbilt University, Fisk Univ, 2Cornell High Energy Synchrotron Source, Cornell University, Ithaca, NY, NOVA Center, Western Kentucky University, Department of Physics, Florida A\&M University, Tallahassee, FL-32307, Correlated Electron Materials Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6061 USA, Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, USA, Department of Electrical and Computer Engineering, University of Rochester, Rochester, NY 14627, USA, The Institute of Optics, University of Rochester, Rochester, NY 14627, USA, Universidade Estadual Paulista (UNESP), Clark Atlanta University, Deapartment of Physics \& Astronomy, Georgia State University, USA, Department of Electrical and Computer Engineering, McGill University, Montreal, QC H3A 2A7, Canada, Oak Ridge National Laboratory, University of South Alabama, Samford University, University of Rochester, University of North Carolina, Chapel Hill, Sandia National Laboratories, New Mexico State University, University of Tennessee Space Institute, Shanghai Jiao Tong University, Shanghai, China, University of Leeds, Leeds, UK, Georgia State University, Atlanta GA, University of Alabama at Birmingham, National High Magnetic Field Laboratory, Prairie View A\&M University, Brookhaven National Laboratory, University of Southern Indiana, Center for Nanophase Materials Sciences at Oak Ridge National Laboratory, JINR(Dubna), Tsinghua Univ., LBNL, Vanderbilt Univ., Vanderbilt Univ./Univ. of Tennessee, Knoxville, Vanderbilt Univ./Univ. of Kentucky, GANIL, Vanderbilt Univ./Union Univ., JINR, ORAU, Tsinghua University, LNBL

  • J.K. Hwang

    Western Kentucky University, University of Pardubice, Francis Marion University, Clemson University Professor, Francis Marion University Professor, Undergraduate Administrator, Oak Ridge National Laboratory, Oak Ridge, Tennessee, Austin Peay State University, University Strenwarte-Muenchen, Seoul National University, Gatton Academy for Science and Mathematics, Alabama A\&M University, Cygnus, Center for Nanophase Materials Science at Oak Ridge National Laboratory, Vanderbilt University, Fisk Univ, 2Cornell High Energy Synchrotron Source, Cornell University, Ithaca, NY, NOVA Center, Western Kentucky University, Department of Physics, Florida A\&M University, Tallahassee, FL-32307, Correlated Electron Materials Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6061 USA, Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, USA, Department of Electrical and Computer Engineering, University of Rochester, Rochester, NY 14627, USA, The Institute of Optics, University of Rochester, Rochester, NY 14627, USA, Universidade Estadual Paulista (UNESP), Clark Atlanta University, Deapartment of Physics \& Astronomy, Georgia State University, USA, Department of Electrical and Computer Engineering, McGill University, Montreal, QC H3A 2A7, Canada, Oak Ridge National Laboratory, University of South Alabama, Samford University, University of Rochester, University of North Carolina, Chapel Hill, Sandia National Laboratories, New Mexico State University, University of Tennessee Space Institute, Shanghai Jiao Tong University, Shanghai, China, University of Leeds, Leeds, UK, Georgia State University, Atlanta GA, University of Alabama at Birmingham, National High Magnetic Field Laboratory, Prairie View A\&M University, Brookhaven National Laboratory, University of Southern Indiana, Center for Nanophase Materials Sciences at Oak Ridge National Laboratory, JINR(Dubna), Tsinghua Univ., LBNL, Vanderbilt Univ., Vanderbilt Univ./Univ. of Tennessee, Knoxville, Vanderbilt Univ./Univ. of Kentucky, GANIL, Vanderbilt Univ./Union Univ., JINR, ORAU, Tsinghua University, LNBL