Controlled Growth of Ultrathin Copper Phthalocyanine Films Adsorbed onto Glass Substrates

POSTER

Abstract

Considerable technological interest in solar energy and other applications have been directed toward understanding the structural properties of single-crystalline organic materials as the performance of molecular electronics devices is pushed to new limits. Initial investigations of the growth of ultrathin copper phthalocyanine (CuPc) films vapor deposited onto glass substrates have been carried out. Individual glass substrates were maintained at discrete temperatures in the range 25 - 200 $^{\circ}$C, in 25 $^{\circ}$C increments. At each temperature, film thickness was varied in the range 0.5 -- 20 {\AA}. Previous x-ray diffraction (XRD) studies indicated substrate temperature was not factor in the molecular orientations within adsorbed film. In the current investigation, we will build on these initial results to include film thickness at each temperature, as indicated. Real-space imaging using atomic force microscopy will be used to compared to the XRD results.

Authors

  • Jesse Finley

    NOVA Center, Western Kentucky University

  • J.K. Hwang

    Western Kentucky University, University of Pardubice, Francis Marion University, Clemson University Professor, Francis Marion University Professor, Undergraduate Administrator, Oak Ridge National Laboratory, Oak Ridge, Tennessee, Austin Peay State University, University Strenwarte-Muenchen, Seoul National University, Gatton Academy for Science and Mathematics, Alabama A\&M University, Cygnus, Center for Nanophase Materials Science at Oak Ridge National Laboratory, Vanderbilt University, Fisk Univ, 2Cornell High Energy Synchrotron Source, Cornell University, Ithaca, NY, NOVA Center, Western Kentucky University, Department of Physics, Florida A\&M University, Tallahassee, FL-32307, Correlated Electron Materials Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6061 USA, Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, USA, Department of Electrical and Computer Engineering, University of Rochester, Rochester, NY 14627, USA, The Institute of Optics, University of Rochester, Rochester, NY 14627, USA, Universidade Estadual Paulista (UNESP), Clark Atlanta University, Deapartment of Physics \& Astronomy, Georgia State University, USA, Department of Electrical and Computer Engineering, McGill University, Montreal, QC H3A 2A7, Canada, Oak Ridge National Laboratory, University of South Alabama, Samford University, University of Rochester, University of North Carolina, Chapel Hill, Sandia National Laboratories, New Mexico State University, University of Tennessee Space Institute, Shanghai Jiao Tong University, Shanghai, China, University of Leeds, Leeds, UK, Georgia State University, Atlanta GA, University of Alabama at Birmingham, National High Magnetic Field Laboratory, Prairie View A\&M University, Brookhaven National Laboratory, University of Southern Indiana, Center for Nanophase Materials Sciences at Oak Ridge National Laboratory, JINR(Dubna), Tsinghua Univ., LBNL, Vanderbilt Univ., Vanderbilt Univ./Univ. of Tennessee, Knoxville, Vanderbilt Univ./Univ. of Kentucky, GANIL, Vanderbilt Univ./Union Univ., JINR, ORAU, Tsinghua University, LNBL

  • J.K. Hwang

    Western Kentucky University, University of Pardubice, Francis Marion University, Clemson University Professor, Francis Marion University Professor, Undergraduate Administrator, Oak Ridge National Laboratory, Oak Ridge, Tennessee, Austin Peay State University, University Strenwarte-Muenchen, Seoul National University, Gatton Academy for Science and Mathematics, Alabama A\&M University, Cygnus, Center for Nanophase Materials Science at Oak Ridge National Laboratory, Vanderbilt University, Fisk Univ, 2Cornell High Energy Synchrotron Source, Cornell University, Ithaca, NY, NOVA Center, Western Kentucky University, Department of Physics, Florida A\&M University, Tallahassee, FL-32307, Correlated Electron Materials Group, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6061 USA, Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, USA, Department of Electrical and Computer Engineering, University of Rochester, Rochester, NY 14627, USA, The Institute of Optics, University of Rochester, Rochester, NY 14627, USA, Universidade Estadual Paulista (UNESP), Clark Atlanta University, Deapartment of Physics \& Astronomy, Georgia State University, USA, Department of Electrical and Computer Engineering, McGill University, Montreal, QC H3A 2A7, Canada, Oak Ridge National Laboratory, University of South Alabama, Samford University, University of Rochester, University of North Carolina, Chapel Hill, Sandia National Laboratories, New Mexico State University, University of Tennessee Space Institute, Shanghai Jiao Tong University, Shanghai, China, University of Leeds, Leeds, UK, Georgia State University, Atlanta GA, University of Alabama at Birmingham, National High Magnetic Field Laboratory, Prairie View A\&M University, Brookhaven National Laboratory, University of Southern Indiana, Center for Nanophase Materials Sciences at Oak Ridge National Laboratory, JINR(Dubna), Tsinghua Univ., LBNL, Vanderbilt Univ., Vanderbilt Univ./Univ. of Tennessee, Knoxville, Vanderbilt Univ./Univ. of Kentucky, GANIL, Vanderbilt Univ./Union Univ., JINR, ORAU, Tsinghua University, LNBL