Analysis of Stoichiometry and Valence in LaVO3 Thin Films

POSTER

Abstract

LaVO3 (LVO) has been proposed as a promising material for photovoltaics because its strongly correlated 3d electrons can facilitate creation of multiple electron-hole pairs per incoming photon, which would lead to increased device efficiency. Our group grows thin films of LVO on SrTiO3 substrates using pulsed laser deposition. We can control the electronic properties and stoichiometry of the films by adjusting laser fluence during growth [1]. A quantitative analysis of multiple samples was done using x-ray photoemission spectroscopy (XPS) to deduce the relative concentrations of Vanadium and Lanthanum. An XPS machine was used to measure the binding energies of these elements, with Carbon 1s (284.6eV) measurements being used to reference any charging on the surface of the material. Resulting peak areas were then used to determine the stoichiometry and measure the valence states. [1] B. Zhang et al. , Phys. Rev. Mater., 5, 085006 (2021).

*A portion of this work was performed at the National High Magnetic Field Laboratory, which is supported by National Science Foundation Cooperative Agreements No. DMR-1157490 and No. DMR-1644779, and the State of Florida. C.B. acknowledges support under grant NSF DMR-1847887

Authors

  • Ty Wilson

    • Florida State University
  • Biwen Zhang

    • Florida State University
  • Christianne Beekman

    • Florida State University