Volumetric Patterning of Thick Gel Films via Interference Lithography

ORAL

Abstract

The volumetric patterning of thick gel films using interference lithography will be discussed. A simple photokinetic model is used to gain insight into experimentally observed trends in achievable critical dimensions, resolutions and print speeds.

*NSF CHE MSN 2003491

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Presenters

  • Chaitanya Ullal

    • Rensselaer Polytechnic Institute

Authors

  • Chaitanya Ullal

    • Rensselaer Polytechnic Institute

  • Shaheen Hasan

    • Rensselaer Polytechnic Institute

  • Mrigaraj Goswami

    • Rensselaer Polytechnic Institute

  • Gopal Kenath

    • Rensselaer Polytechnic Institute

  • Harikrishnan Vijayamohanan

    • Massachusetts Institute of Technology
    • Rensselaer Polytechnic Institute

  • Xuan Luo

    • University of Central Florida

  • Edmund Palermo

    • Rensselaer Polytechnic Institute

  • Kyu young Han

    • University of Central Florida

  • Jason Huang

    • Rensselaer Polytechnic Institute

  • Apostolos Karanastasis

    • Rensselaer Polytechnic Institute