Toward in operando measurements of nano-scale transport within devices: High-frequency XFMR
ORAL · Invited
Abstract
As a demonstration, we used this instrument to perform high-frequency, x-ray detected ferromagnetic resonance spectroscopy (XFMR) of three magnetic thin-film samples on opaque silicon substrates. XFMR is widely used at synchrotron light sources to study magnetic/spin dynamics at and across interfaces, but has not before been performed at the laboratory scale and is usually limited to frequencies below 12 GHz.[2] The ability to perform XFMR at higher frequencies enables studies of materials with high magnetic anisotropy, in addition to ferrimagnets, antiferromagnets, and high-wavevector excitations in nanodevices. The measurements shown here highlight the ability of our instrument to perform high-frequency, element- and/or layer-resolved XFMR, and can be combined with ptychographic reflectometry for enhanced sensitivity as well as 3D nano-scale resolution.[3]
*M.T. and J.W. acknowledge funding support from the National Research Council (NRC) Post-Doctoral Fellowship program. H.T.N. acknowledges support through the NIST cooperative agreement 70NANB18H006 with the University of Colorado Boulder.
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Publication: [1] M. Tanksalvala et al., "Element-specific high-bandwidth ferromagnetic resonance spectroscopy with a coherent extreme-ultraviolet source," Phys Rev Appl 21.6, 064047 (2024).
[2] G. van der Laan, "Time-resolved X-ray detected ferromagnetic resonance of spin currents," J Electron Spectrosc 220, 137-146 (2017).
[3] M. Tanksalvala et al. "Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry." Science Advances 7.5, eabd9667 (2021).
Presenters
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Michael Tanksalvala
- National Institute of Standards and Technology (NIST)