Insight into Facile Ion Diffusion in Resistive Switching Medium toward Low Operating Voltage Memory

ORAL

Abstract

The rapid increase in data storage worldwide demands a substantial amount of energy consumption annually. Studies looking at low power consumption accompanied by high-performance memory are essential for next-generation memory. Here, Graphdiyne Oxide (GDYO), characterized by facile resistive switching behavior, is systematically reported toward low switching voltage memristor. The intrinsic large, homogeneous pore-size structure in GDYO facilitates ion diffusion processes, effectively suppressing the operating voltage. The theoretical approach highlights the remarkably low diffusion energy of the Ag ion (0.11 eV) and oxygen functional group (0.6 eV) within three layers of GDYO. The Ag/GDYO/Au memristor exhibits an ultralow operating voltage of 0.25 V in GDYO thickness of 5 nm; meanwhile, the thicker GDYO of 29 nm presents multi-level memory with an ON/OFF ratio of up to 104. The findings shed light on memory resistive switching behavior, facilitating future improvements in GDYO-based devices toward opto-memristors, artificial synapses, and neuromorphic applications.

*This work was supported by the National Research Foundation of Korea (NRF) grant (NRF-2022R1A2C2093415) and partially supported by the Korea Basic Science Institute (National Research Facilities and Equipment Center) grant funded by the Ministry of Education (2022R1A6C101A751). We also thank the Center for Computational Materials Science, Institute for Materials Research, Tohoku University, Japan, for the use of MASAMUNE-IMR, Cray XC50-LC supercomputer facility (No. 2312SC0206).

Publication: https://pubs.acs.org/doi/10.1021/acs.nanolett.4c01629

Presenters

  • Dinh Phuc Do

    • University of Nevada Las Vegas

Authors

  • Dinh Phuc Do

    • University of Nevada Las Vegas