Isospin Pomeranchuk effect and finite temperature resistance minimum in rhombohedral graphene

ORAL

Abstract



Magnetism typically arises from the effect of exchange interactions on highly localized fermionic wave functions in f- and d-atomic orbitals. In rhombohedral graphene multilayers, in contrast, magnetism---manifesting as spontaneous polarization into one or more spin and valley flavors originates from fully itinerant electrons near a Van Hove singularity. Here, we study the electronic compressibility, proximal exciton sensing, and electronic transport measurements of Bernal Bilayer Graphene (BBG) and Rhombohedral Trilayer Graphene (RTG) devices as a prototypical example for itinerant magnetism. While magnetic ordering - observed most clearly via the onset of the anomalous Hall effect in valley polarized phases—occurs only below 2-3K, we find a fluctuation regime persisting to temperature more than one order of magnitude higher with an associated large excess entropy of ~0.8kB/charge carrier. As a consequence, increasing temperature can favor the formation of a fluctuating ordered phase, analogous to the Pomeranchuk effect in 3He. In temperature dependent transport measurements, we observe a decreasing resistance with increasing temperature throughout the fluctuation regime, a highly unusual behavior for metals. The negative temperature coefficients lead to a minimum of R(T) within the fluctuation phases of around 10-20K. We connect the negative dR/dT to the fluctuation regime and discuss possible mechanisms.

Presenters

  • Ludwig Holleis

    • University of California Santa Barbara
    • University of California, Santa Barbara

Authors

  • Ludwig Holleis

    • University of California Santa Barbara
    • University of California, Santa Barbara
  • Tian Xie

    • University of California, Santa Barbara
  • Haoxin Zhou

    • University of California, Berkeley and Lawrence Berkeley National Laboratory
    • University of California, Berkeley
  • Siyuan Xu

    • UCSB
    • University of California, Santa Barbara
    • University of California Santa Barbara
  • Caitlin L Patterson

    • University of California, Santa Barbara
  • Archisman Panigrahi

    • Massachusetts Institute of Technology
  • Takashi Taniguchi

    • National Institute for Materials Science
    • International Center for Materials Nanoarchitectonics, National Institute for Materials Science
    • Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan
    • Advanced Materials Laboratory, National Institute for Materials Science
  • Kenji Watanabe

    • National Institute for Materials Science
    • NIMS
    • Research Center for Functional Materials, National Institute for Materials Science
    • Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan
    • National Institute of Materials Science
    • Advanced Materials Laboratory, National Institute for Materials Science
  • Leonid Levitov

    • Massachusetts Institute of Technology
  • Chenhao Jin

    • University of California, Santa Barbara
    • Cornell University
    • University of California at Santa Barbara
  • Erez Berg

    • Weizmann Institute of Science
  • Andrea F Young

    • University of California, Santa Barbara
    • University of California Santa Barbara
    • University of California at Santa Barbara