Study of Growth and Properties of Chromium Oxynitride Thin Films for Supercapacitor Electrodes

POSTER

Abstract



This study presents an in-depth analysis of the synthesis and characterization of chromium and chromium oxynitride (CrOxN1-x) thin films grown on silicon and fused silica substrates by radiofrequency magnetron sputtering. The films are studied for their potential application as electrodes in supercapacitors. The effect of the growth conditions on the structural, electronic, and optical properties are studied. The bandgap of CrOxN1-x is found to change from 0.28 eV to 2.85 eV [1]. The Cr and CrOxN1-x films demonstrate interesting electrochemical performance, such as areal capacitance, cyclic stability, charge retention, and Coulombic efficiency. These results show the impact of growth conditions on the characteristics of the films and their implications for enhancing supercapacitor performance.

*This work was supported by the Deanship of Research Oversight and Coordination of King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia under grant No. ISP23218.

Publication: [1] W. Sanjo Kamoru, M. Baseer Haider, B. Ul Haq, S. H. Aleithan, A. M. Alsharari, S. Ullah, and K. Alam, Structural, Electronic, and Optical Properties of Chromium Oxynitride Thin Films Grown by RF Magnetron Sputtering, Results Phys. 57, 107387 (2024).

Presenters

  • Khan Alam

    • King Fahd University of Petroleum and Minerals

Authors

  • Khan Alam

    • King Fahd University of Petroleum and Minerals

  • Kamoru W Sanjo

    • Department of Physics, King Fahd University of Petroleum and Minerals

  • Syed S Shah

    • Department of Material Chemistry, Graduate School of Engineering, Kyoto University

  • Muhammad Baseer Haider

    • King Fahd University of Petroleum and Minerals

  • Bakhtiar U Haq

    • Jeju National University

  • Shrouq Aleithan

    • King Faisal University