Direct measurement of monolayer WSe<sub>2 </sub>chemical potential

ORAL

Abstract

Thermodynamic properties of electronic materials can provide unique insight into the band structure and electron interaction effects. We investigate the chemical potential of monolayer WSe2 using an independently contacted double layer structure where the top layer consists of monolayer WSe2, and the bottom layer is a monolayer graphene gate. In addition, the double layer structure has top and bottom gates, to control the densities in the WSe2 and monolayer graphene, respectively. This device structure enables direct chemical potential measurements by using graphene back gate as a resistively detected Kelvin probe. Indeed, by tracking the charge neutrality point of the graphene gate as a function of interlayer voltage and top gate voltage, which in turn controls the WSe2 layer carrier density we are able to directly measure the WSe2 layer chemical potential over a wide range of doping densities in the valence and conduction bands, as well as across the bandgap. Remarkably, our measurements are also able to access the WSe2 monolayer chemical potential in the highly insulating regime at low doping concentrations.

*The work at The University of Texas was supported by the National Science Foundation Grants MRSEC DMR-2308817 and EECS-2122476, the Army Research Office under Grant No. W911NF-22-1-0160, and the Welch Foundation grant F-2169-20230405. K.W. and T. T. acknowledge support from the Elemental Strategy Initiative conducted by the MEXT, Japan (Grant No. JPMXP0112101001) and JSPS KAKENHI (Grants No. JP19H05790 and No. JP20H00354). K. U. acknowledges support from the JSPS KAKENHI Grants No. JP25107004, No. JP18H01822, No. JP21K04826, and No. JP22H05445.

Presenters

  • Taeran Lee

    • Microelectronics Research Center, Department of Electrical and Computer Engineering, The University of Texas at Austin
    • University of Texas at Austin

Authors

  • Taeran Lee

    • Microelectronics Research Center, Department of Electrical and Computer Engineering, The University of Texas at Austin
    • University of Texas at Austin
  • Yimeng Wang

    • Microelectronics Research Center, Department of Electrical and Computer Engineering, The University of Texas at Austin
  • Keiji Ueno

    • Department of Chemistry, Saitama University, Japan
    • Department of Chemistry, Graduate School of Science and Engineering, Saitama University
    • Department of Chemistry, Graduate School of Science and Engineering, Saitama University, Saitama, Japan
  • Kenji Watanabe

    • National Institute for Materials Science
    • NIMS
    • Research Center for Functional Materials, National Institute for Materials Science
    • Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan
    • National Institute of Materials Science
    • Advanced Materials Laboratory, National Institute for Materials Science
  • Takashi Taniguchi

    • National Institute for Materials Science
    • International Center for Materials Nanoarchitectonics, National Institute for Materials Science
    • Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan
    • Advanced Materials Laboratory, National Institute for Materials Science
  • Emanuel Tutuc

    • Microelectronics Research Center, Department of Electrical and Computer Engineering, The University of Texas at Austin
    • University of Texas at Austin