Systematic studies of surface smoothness of quantum solid thin films

ORAL

Abstract

There has been considerable recent interest in using electrons trapped on the surface of quantum solids as a platform for quantum information processing. A primary advantage of this platform is the quasi-vacuum environment that these surface electrons occupy, free from the deleterious influence of two-level fluctuators, quasiparticles, and dangling bonds due to the high purity of quantum solids. To enable improved qubit performance, reduced charge noise, and potential scalability, methods need to be developed to reliably and controllably grow ultrasmooth quantum solid thin films.



In this talk, I will present our studies of surface smoothness on two quantum solids, solid neon and solid hydrogen, which are of specific interest for use in quantum information processing. Using low-frequency AC mobility measurements to characterize surface smoothness, we compare the outcomes of films grown on silicon and sapphire via quench condensation or triple-point wetting. Additionally, we explore the effects of annealing in improving the surface smoothness.

*We acknowledge support from the Air Force Office of Scientific Research (AFOSR) under Award No. FA9550-23-1-0636, the Department of Energy (DOE) under Award No. DE-SC0025542, and the National Science Foundation (NSF) under Award No. OSI-2426768.

Presenters

  • Alec Dinerstein

    • University of Notre Dame

Authors

  • Alec Dinerstein

    • University of Notre Dame
  • Shan Zou

    • University of Notre Dame
  • Evgenii Zaitsev

    • University of Notre Dame
  • Yutian Wen

    • University of Notre Dame
  • Sergei Sheludiakov

    • PsiQuantum
    • University of Notre Dame
  • Dafei Jin

    • Notre Dame
    • University of Notre Dame