Negative differential resistance with high peak-to-valley ratio via subband resonant tunneling of Γ-valley carriers in WSe<sub>2</sub>/h-BN/WSe<sub>2</sub> junctions
ORAL
Abstract
Resonant tunneling diodes (RTDs) exhibit negative differential resistance (NDR) in current-voltage characteristics, which is important in various device applications including high-frequency and logic circuits. In this study, we explore a range of WSe2/h-BN/WSe2 RTD devices by varying the number of layers of WSe2, and observe the highest peak-to-valley ratio (PVR) values of 63.6 at 2 K and 16.2 at 300 K with source 3-layer (3L) WSe2 and drain 1-layer (1L) WSe2. These PVR values are the highest ever reported for RTDs based on two-dimensional (2D) materials. Traditionally, RTDs were realized in III-V semiconductor superlattices, but high-performance RTDs based on 2D materials have been long awaited. Our findings highlight two key conditions for achieving high PVR: 1) resonant tunneling should occur between the Γ-point bands of the source and drain WSe2, and 2) the Γ-point bands contributing to the resonant tunneling should be energetically separated from the other bands. These insights mark a significant step towards surpassing the performance of III-V semiconductor RTDs using 2D materials.
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Presenters
Kei Kinoshita
Univ of Tokyo
Authors
Kei Kinoshita
Univ of Tokyo
Rai Moriya
The University of Tokyo
Univ of Tokyo
Institute of Industrial Science, University of Tokyo
Seiya Kawasaki
Univ of Tokyo
Shota Okazaki
Science Tokyo
Momoko Onodera
Univ of Tokyo
Yijin Zhang
The University of Tokyo
Univ of Tokyo
Kenji Watanabe
National Institute for Materials Science
NIMS
Research Center for Functional Materials, National Institute for Materials Science
Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan
National Institute of Materials Science
Advanced Materials Laboratory, National Institute for Materials Science
Takashi Taniguchi
National Institute for Materials Science
International Center for Materials Nanoarchitectonics, National Institute for Materials Science
Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan
Advanced Materials Laboratory, National Institute for Materials Science
Takao Sasagawa
Science Tokyo
Institute of Science Tokyo
Tokyo Inst of Tech - Yokohama
Tomoki Machida
The University of Tokyo
Institute of Industrial Science, The University of Tokyo
Univ of Tokyo
Institute of Industrial Science, University of Tokyo