Study of local effects of boron doping and voltage on antiferromagnetic domains switching in chromia thin films and devices

ORAL  · Invited

Abstract

Chromia (Cr2O3) is a magnetoelectric antiferromagnetic (AFM) oxide that allows voltage-control of the Néel vector under the presence of a magnetic field [1]. Boron doping of Cr2O3 increases the Néel temperature from 307 to 400 K [2] and it is believed to break the local symmetry giving rise to transient polarization under an applied electric field, and thus to voltage magnetic field free control of the Néel vector [2]. Here, we use magnetic microscopy based on nitrogen-vacancy (NV) centers in diamond [3] to image the stray fields resulting from single layers of uncompensated spins on the surface and interface of pure and B-doped Cr2O3 films with Al2O3 substrates [4]. The acquired image confirms the presence of homogeneously AFM domains with size ∼ 50 – 300 nm that depends strongly on the film thickness (50 – 300 nm), explained by the increased germ density, likely associated with the B doping [5]. Reconstruction of the surface magnetization from the NV stray-field maps unveils a clear difference between the pure and B-doped Cr2O3 films, displayed by the histogram distribution of the AFM ordering, i.e., 90° domains for the B doped films, and 180°domains for pure films [5]. We discuss preliminary results on voltage induced Néel vector 90° switching in B:Cr2O3/V2O3 devices [5], a promising result for AFM spintronics. [1] X. He, et al., Nat. Mat. 9, 579 (2010). [2] A. Mahmood, et al., Nat. Comm. 12, 1674 (2021). [3] A. Laraoui, K. Ambal, Appl. Phys. Lett. 121, 060502 (2022). [4] A. Erickson, A. Laraoui, et al., RSC Adv. 13, 178 (2023). [5] A. Erickson, A. Laraoui. et al., Advanced Functional Materials 2408542 (2024).

*This work was supported by the National Science Foundation/EPSCoR RII Track-1: Emergent Quantum Materials and Technologies (EQUATE), Award (OIA-2044049). Ilja Fescenko acknowledges support from the Latvian Quantum Initiative under European Union Recovery and Resilience Facility project no. (2.3.1.1.i.0/1/22/I/CFLA/001). The research was performed in part in the Nebraska Nanoscale Facility: National Nanotechnology Coordinated Infrastructure and the Nebraska Center for Materials and Nanoscience (and/or NERCF), supported by the National Science Foundation under Award (ECCS: 2025298), and the Nebraska Research Initiative.

Publication: Advanced Functional Materials 2408542, 2024. DOI: https://doi.org/10.1002/adfm.202408542

Presenters

  • Abdelghani Laraoui

    • University of Nebraska - Lincoln

Authors

  • Abdelghani Laraoui

    • University of Nebraska - Lincoln
  • Adam D Erickson

    • University of Nebraska - Lincoln
  • Syed Qamar Abbas Shah

    • University of Nebraska-Lincoln
  • Ather Mahmood

    • University of Nebraska - Lincoln
  • Pratyush P Buragohain

    • University of Nebraska - Lincoln
  • Ilja Fescenko

    • University of Latvia
  • Alexei Gruverman

    • University of Nebraska - Lincoln
  • Christian Binek

    • University of Nebraska - Lincoln