Giant enhancement of exciton diffusion near an electronic Mott insulator

ORAL

Abstract

Bose-Fermi mixtures naturally appear in various physical systems. In semiconductor heterostructures, such mixtures can be realized, with bosons as excitons and fermions as dopant charges. However, the complexity of these hybrid systems challenges the comprehension of the mechanisms that determine physical properties such as mobility. In this study, we investigate interlayer exciton diffusion in an H-stacked WSe2/WS2 heterobilayer. Our measurements are performed in the dilute exciton density limit at low temperatures to examine how the presence of charges affects exciton mobility. Remarkably, for charge doping near the Mott insulator phase, we observe a giant enhancement of exciton diffusion of three orders of magnitude compared to charge neutrality. We attribute this observation to mobile valence holes, which experience a suppressed moiré potential due to the electronic charge order in the conduction band, and recombine with any conduction electron in a non-monogamous manner. This new mechanism emerges for sufficiently large fillings in the vicinity of correlated generalized Wigner crystal and Mott insulating states. Our results demonstrate the potential to characterize correlated electron states through exciton diffusion and provide insights into the rich interplay of bosons and fermions in semiconductor heterostructures.

*This work was supported by the National Science Foundation under Award No. DMR-2145712, Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany's Excellence Strategy–EXC–2111–390814868, and the European Research Council (ERC) under the European Unions Horizon 2020 research and innovation programme (Grant Agreement No. 851161).

Publication: Upadhyay, P., Suárez-Forero, D. G., Huang, T.-S., Mehrabad, M. J., Gao, B., Sarkar, S., Session, D., Watanabe, K., Taniguchi, T., Zhou, Y., Knap, M., & Hafezi, M. (2024). Giant enhancement of exciton diffusion near an electronic Mott insulator. arXiv. https://arxiv.org/abs/2409.18357

Presenters

  • Pranshoo Upadhyay

    • University of Maryland College Park

Authors

  • Pranshoo Upadhyay

    • University of Maryland College Park
  • Daniel G Suárez Forero

    • University of Maryland
  • Tsung-Sheng Huang

    • University of Maryland College Park
  • Mahmoud Jalali Mehrabad

    • University of Maryland College Park
  • Beini Gao

    • University of Maryland College Park
  • Supratik Sarkar

    • University of maryland
  • Deric Session

    • University of Maryland
  • Kenji Watanabe

    • National Institute for Materials Science
    • NIMS
    • Research Center for Functional Materials, National Institute for Materials Science
    • Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan
    • National Institute of Materials Science
    • Advanced Materials Laboratory, National Institute for Materials Science
  • Takashi Taniguchi

    • National Institute for Materials Science
    • International Center for Materials Nanoarchitectonics, National Institute for Materials Science
    • Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan
    • Advanced Materials Laboratory, National Institute for Materials Science
  • You Zhou

    • University of Maryland College Park
  • Michael Knap

    • Tech Univ Muenchen
  • Mohammad Hafezi

    • University of Maryland College Park