UOTe: Kondo-interacting topological antiferromagnet in a van der Waals lattice

ORAL

Abstract

Since the initial discovery of two-dimensional van der Waals (vdW) materials, significant effort has been made to incorporate the three properties of magnetism, band structure topology, and strong electron correlations — to leverage emergent quantum phenomena and expand their potential applications. However, the discovery of a single vdW material that intrinsically hosts all three ingredients has remained an outstanding challenge. Here we report the discovery of a Kondo-interacting topological antiferromagnet in the vdW 5f electron system UOTe. It has a high antiferromagnetic (AFM) transition temperature of 150 K, with a unique AFM configuration that breaks the combined parity and time reversal (PT) symmetry in an even number of layers while maintaining zero net magnetic moment. Our angle-resolved photoemission spectroscopy (ARPES) measurements reveal Dirac bands near the Fermi level, which combined with our theoretical calculations demonstrate UOTe as an AFM Dirac semimetal. Within the AFM order, we observed the presence of the Kondo interaction, as evidenced by the emergence of a 5f flat band near the Fermi level below 100 K and hybridization between the Kondo band and the Dirac band. Our density functional theory calculations in its bilayer form predict UOTe as a rare example of a fully-compensated AFM Chern insulator.

*The work at Washington University is supported by the NSF Division of Materials Research Award DMR-2236528. The work at Howard University, work supported by the U.S. DOE, under Grant No. DE-SC0022216. M. Liu acknowledges the Harvard Quantum Initiative Postdoctoral Fellowship. J. Ahn was supported by the Center for Advancement of Topological Semimetals, under contract No. DE-AC02-07CH11358.The single crystal X-ray structure determination was supported by the U.S. DOE via the grant DE-SC0023648. D.L. and L.Y. are supported by the AFOSR Grant No. FA9550-20-1-0255. Research at the University of Arizona is supported by the NSF under Award No. DMR-2338229. Photoemission used resources of the Advanced Light Source, under contract no. DE-AC02-05CH11231. The work at ORNL was supported by the U.S. DOE, under Contract DE-AC05-00OR22725.

Presenters

  • Christopher Broyles

    • Washington University, St. Louis

Authors

  • Christopher Broyles

    • Washington University, St. Louis
  • Sougata Mardanya

    • Howard University
  • Mengke Liu

    • Harvard University
  • Junyeong Ann

    • Harvard University
  • Thao H Dinh

    • Harvard University
  • Gadeer Alqasseri

    • Howard University
    • Howard university
  • Jalen Garner

    • Howard University
  • Zackary R Rehfuss

    • Washington University, St. Louis
  • Ken Guo

    • Washington University, St. Louis
  • Jiahui Zhu

    • Washington University, St. Louis
  • David Martinez

    • Washington University, St. Louis
    • Washington University at St. Louis
  • Du Li

    • Washington University, St. Louis
  • Yiqing Hao

    • Oak Ridge National Laboratory
  • Huibo Cao

    • Oak Ridge National Laboratory
  • Weiwei Xie

    • Michigan State University
  • Tai Kong

    • University of Arizona
  • Li Yang

    • Washington University, St. Louis
  • Ashvin Vishwanath

    • Harvard University
  • Philip Kim

    • Harvard University
  • Su-Yang Xu

    • Harvard University
  • Jennifer E Hoffman

    • Harvard University
  • Jonathan D Denlinger

    • Lawrence Berkeley National Laboratory
    • Advanced Light Source, Lawrence Berkeley National Laboratory
  • Sugata Chowdhury

    • Howard University
  • Sheng Ran

    • Washington University, St. Louis