Realizing Sub-3 nm Vertical Lamellar Features in Thin Films by In-Situ Hydrolysis of PSM-b-P4VBP

ORAL

Abstract

We synthesized linear diblock copolymers of poly(solketal methacrylate-b-4‑vinyl biphenyl) (PSM‑b-P4VBP) that can form vertical sub-3 nm lamellar domains in thin films after in-situ acid catalyzed hydrolysis, among the smallest reported for synthetic block copolymers. Acid hydrolysis with trifluoracetic acid (TFA) vapor converts the hydrophobic PSM block into hydrophilic poly(glycerol monomethacrylate) (PGM), increasing immiscibility with P4VBP and driving microphase separation in the resulting PGM‑b-P4VBP. In the bulk state, small-angle X-ray scattering (SAXS) confirms lamellas with a 5.7 nm full-pitch, while thin films exhibit vertically aligned lamellae with a 5.4 nm full-pitch as verified by grazing-incidence SAXS (GISAXS) and atomic force microscopy (AFM). The interaction parameter 𝜒 for both PSM‑b-P4VBP and PGM‑b-P4VBP are determined by temperature-dependent SAXS.

*This work was supported by Air Force Office of Scientific Research under contract number FA9550-25-1-0003 and Army Research Office under contract number W911NF-24-2-0041.

Presenters

  • Xuchen Gan

    • University of Massachusetts Amherst

Authors

  • Xuchen Gan

    • University of Massachusetts Amherst
  • Yashodha Kahandawaarachchi

    • University at Buffalo
  • Xindi Li

    • University at Buffalo
  • Mingqiu Hu

    • University of Massachusetts Amherst
  • Zhan Chen

    • University of Massachusetts Amherst
  • zichen jin

    • University of Massachusetts Amherst
  • Preetika Rastogi

    • Lawrence Berkeley National Laboratory
  • Paul D Ashby

    • Lawrence Berkeley National Lab
    • Lawrence Berkeley National Laboratory
    • Molecular Foundry
  • Javid Rzayev

    • University at Buffalo
  • Thomas P. Russell

    • University of Massachusetts Amherst
    • University of Massachusetts, Amherst and Lawrence Berkeley National Laboratory