Design of a DC Magnetron Sputterer for Deposition of Thin Films

Magnetron sputtering is a widely used physical vapor deposition technique in solid state physics research, with applications including the deposition of metal-semiconductor contacts, integrated circuit traces, and seed layers. While crystalline thin film deposition of various material systems has been previously demonstrated via direct current (DC) magnetron sputtering, most commercially available sputtering systems tend to be cost prohibitive for smaller institutions.

This study details the design and construction of an economical DC magnetron sputtering system that is suitable for use in the undergraduate physics laboratory. The performance of the sputtering system is demonstrated by deposition of a variety of thin films, and subsequent characterization of film morphology, crystallinity, and electrical properties demonstrate the design’s viability for high-quality condensed matter research experiences for undergraduates.