A Fast MATLAB Framework for Visualizing Plasma Etching on ReSe2

We present a MATLAB framework for visualizing plasma etching of ReSe₂. The model applies interpolated angle-dependent sputter-yield data with a cosine-law incidence and an effective ion-energy scaling to generate 1D, 2D, and 3D trench profiles under simplified assumptions (uniform flux, static incidence geometry, fixed binding-energy scale). While not a full dynamic evolution solver, it qualitatively shows how incidence angle and ReSe₂'s in-plane anisotropy shape etched profiles. The framework provides a lightweight baseline for future extensions to time-dependent, anisotropic etching with evolving normals, transport/shadowing, and redeposition.