In-Situ Automated AFM Tip-Assisted Nanofabrication of Two-Dimensional Heterostructure Channels

Precise etching of grown or exfoliated 2D layers is essential for fabricating quantum devices, especially those operating at cryogenic temperatures. Conventional techniques such as lithography and focused ion beam (FIB) have enabled nanoscale patterning but face limitations when applied to delicate superconducting materials, including atmospheric sensitivity, contamination, and damage at sub-200 nm scales. To overcome these challenges, we introduce a compact, computer-automated mechanical cutting system using AFM tips inside an argon-filled glovebox. This inert-environment approach enables clean, high-resolution patterning of 2D superconductors with cutting widths ranging from a few microns down to 150 nm, offering a reproducible and scalable alternative for quantum device fabrication. I will discuss the observations of applying this technique under a range of applied velocity and force with their implications in inducing surface edge disorder in comparison to conventional methods.