Scalable Hybrid Synthesis of Graphene Nanoribbon Arrays

Graphene can be transformed from a semimetal into a semiconductor by confining it into quasi-1D nanoribbons with narrow sub-10-nm widths and precise armchair edge structures. To achieve the high-drive current required in next-gen high-performance electronics, nanoribbons additionally need to be organized into large-area arrays with controlled placement, alignment, and packing density. However, producing such nanoribbon arrays remains a major challenge. In this work, we develop a hybrid approach that overcomes this challenge. Our approach combines the ability of top-down lithography to precisely control the placement and alignment of millions of nanoribbons within a large-area array with the ability of bottom-up chemical synthesis to control the nanoribbon edge structure in the sub-10-nm width regime. The basic thermodynamic and kinetic processes governing this hybrid approach will be discussed, along with charge transport data of nanoribbon field-effect transistors. This approach enables improved edge quality and dimensional uniformity while remaining scalable and industry-compatible, offering a practical pathway toward rationally controlled, large-area nanoribbon arrays for next-gen semiconductor technologies.