Calibrating aging after alternating-bias assisted annealingm (ABAA) for scaling to multiple qubits in large systems

Understanding the drift of the Josephson junction resistance after ABAA trimming is critical for accurate targeting in large scale superconducting processers. In this talk we address the dynamics of the resistance change from short-term to long-term effects. We report the sudden changes due to the voltage application and removal, and track the longer term drift as the junctions settle. The differences between nominally identical junctions are identified and time scales for the divergences between the trimmed values are reported. The possible connections between grain structure and morphology at the atomic level, as evaluated from published molecular dynamics of the amorphous junctions, will be discussed.