Vanadium Dioxide Thin Films Created by a Sol-Gel Process

Vanadium dioxide (VO₂) thin films are created by spin-coating precursor gels, formed by dissolving vanadium (V) powder in hydrogen peroxide (H₂O₂) solution, on silicon and fused silica substrates. The samples are then annealed at different temperatures, in vacuum and in ambient environment, respectively. The structural and electronic properties of the VO₂ thin films, and their dependence on the substrate and the annealing conditions, are investigated and will be reported.