Er<sub>Al</sub>:Al<sub>2</sub>O<sub>3</sub> for Telecom-Band Photonics: Electronic Structure and Optical Properties

Poster-In-person

Abstract

Er-doped Al₂O₃ is a promising, CMOS-compatible host for telecom-band integrated photonics. We combine ab initio calculations with a symmetry-resolved analysis to elucidate substitutional Er on the Al site (ErAl) in α-Al₂O₃. First-principles relaxation confirms the structural stability of ErAl. Using the local trigonal crystal-field symmetry, we classify the Er-derived impurity levels by irreducible representations and derive polarization-resolved electric-dipole selection rules, explicitly identifying the symmetry-allowed 4f–5d hybridization channels. Kubo–Greenwood absorption spectra computed from Kohn–Sham states quantitatively corroborate these symmetry predictions. We further connect the calculated intra-4f line strengths to Judd–Ofelt theory, clarifying the role of 4f–5d admixture in enabling optical activity. Notably, we predict a characteristic absorption near 1.47 µm (telecom band), directly relevant for on-chip amplification and emission. To our knowledge, a symmetry-resolved first-principles treatment of Er:Al₂O₃ with an explicit Judd–Ofelt interpretation has not been reported, providing a transferable framework for tailoring rare-earth dopants in wide-band-gap oxides for integrated photonics. Our theoretical spectrum is in good agreement with available experimental data.

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Publication: https://arxiv.org/abs/2509.18409

Presenters

  • Mahtab Khan

    • University of Central Florida, NanoScience Technology Center

Authors

  • Mahtab Khan

    • University of Central Florida, NanoScience Technology Center
  • Jayden Craft

  • Hari Paudel

    • The National Energy Technology Laboratory (NETL)
  • Yuhua Duan

    • National Energy Technology Laboratory (NETL)
  • Dirk Englund

    • Columbia University
  • Michael Leuenberger

    • University of Central Florida