Engineered electron crystals in monolayer MoSe<sub>2</sub> via nano-scale gate patterning
ORAL
Abstract
*We acknowledge support from NSF Grant Nos. ECCS-2054572, ECCS-2428575, No. ECCS-2122462, ECCS-2235276, AFOSR Grant Nos. FA9550-22-1-0220, FA9550-22-1-0312, FA9550-22-1-0113. This work was additionally supported by the JSPS KAKENHI (Grant Numbers 21H05233 and 23H02052), the CREST (JPMJCR24A5), JST and World Premier International Research Center Initiative (WPI), MEXT, Japan, the Gordon and Betty Moore Foundation grants DOI 10.37807/GBMF13840 and their EPiQS Initiative grant GBMF9069, and the 2023 Technology Research Initiative Fund - National Security Systems - Novel Materials Project, administered by the University of Arizona Office of Research and Partnerships (ORP), funded under Proposition 301, the Arizona Sales Tax for Education Act, in 2000.
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Publication: Title: Crystallizing electrons with artificially patterned lattices
Presenters
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Trevor Stanfill
- University of Arizona