Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system

ORAL

Abstract

Quantum two-dimensional materials, including ultrathin superconducting films, are of great current research interest. These films are typically fabricated under ultra-high vacuum (UHV) conditions and are sensitive to the environment—prone to oxidation and contamination when exposed to the atmosphere. This hampers the study of their intrinsic properties by standard ex situ techniques. Here, we present a variable-temperature mutual inductance probe system integrated under UHV with molecular beam epitaxy (MBE) synthesis and low-energy electron microscopy, enabling nondestructive in situ characterization of superconducting thin films. The system employs a reflection-type configuration and reaches a low temperature (∼4 K) using a high-cooling-power, vibration-isolated cryocooler. We demonstrate the system performance by measuring the superconducting critical temperature in a copper-oxide thin film.

*LSCO films were synthesized and characterized at Brookhaven National Laboratory with support from the U.S. Department of Energy, Basic Energy Sciences, Materials Sciences and Engineering Division. The in situ inductance probe was designed, built, and attested at Yale University with support from the Gordon and Betty Moore Foundation's EPiQS Initiative through Grant No. 276 GBMF9074. The data were analyzed, and the paper was written with support from the National Key R&D Program of China (No. 2024YFA1410000), the National Natural Science Foundation 280 of China (No. 62474172), and SHARPS.

Publication: https://doi.org/10.1116/6.0004699

Presenters

  • Rongting Wu

    • Institute Of Semiconductors, CAS
    • State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences
    • Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences

Authors

  • Rongting Wu

    • Institute Of Semiconductors, CAS
    • State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences
    • Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences
  • Ivan Bespalov

    • Caltech
    • Department of Applied Physics and Materials Science, Caltech
  • Xi He

    • Brookhaven National Laboratory
  • Jin Zhao

    • Emory University
    • Department of Physics, Emory University
  • Ivan Bozovic

    • SHARPS
    • Shanghai Advanced Research in Physical Sciences (SHARPS)