Random Co-polymer Brushes: on Silicon; and on Amorphous Silicon Carbide on Silicon

ORAL

Abstract

Deposition of random copolymer (RCP) brushes is a standard surface preparation for deposition of diblock copolymers on Si and related surfaces. We did a comparative study of cleaning methods for substrate preparation, and optimized the procedures for deposition of P(S-r-MMA) on Si, and amorphous SiC films on Si substrates. In both cases, we found a minimum anneal time of 8 h. We found no relation between RCP concentration in solution and ultimate RMS roughness. We found a successful non-destructive method for verification of RCP presence on both Si and SiC on Si substrates. We also found Super Critical CO$_{2}$ to be an effective alternative rinse method for removal of excess RCP after anneal

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Authors

  • Eric Botello

  • William Gibson

  • Guy Hilburn

  • Richard Griffin

  • Jeremy Jarl

  • Elizabeth Covington

  • Phillip Hartnet

  • Deborah Koeck

  • David Donnelly

  • Heather Galloway

    • Department of Physics, Texas State Unv. - San Marcos

  • Suresh Murugesan

  • Gary Beall

  • Chad Booth

  • Patrick Cassidy

    • Department of Chemistry and Biochemistry, Texas State Unv. - San Marcos