Sub-Wavelength Lithography Using Nitrogen-Vacancy Color Centers in Diamond
ORAL
Abstract
In classical optical lithography, resolution is limited to about half of the wavelength of the source used in the process. However, as we reach high frequencies (Deep UV or X-ray), several problems and difficulties occur. Over the last decade, several techniques were suggested to go beyond the classical limit. In 2010, Liao, Alamri, and Zubairy proposed a method using two lasers with different frequencies; one is used to induce Rabi oscillations between two states and the other is used to excite the ground state to a third state, thus writing the lithography pattern. In this presentation I will talk about an experimental approach to implement their method of sub-wavelength lithography using optical and magnetic properties of NV color centers in diamond.
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