Rate constants for the formation of SiO and CS by radiative association
POSTER
Abstract
Rate constants for the formation of SiO and CS by radiative association are calculated using accurate molecular data. The rate constants include both direct and indirect formation processes. The indirect processes (inverse rotational and electronic predissociation) are evaluated for conditions of local thermodynamic equilibrium (LTE) and also in the non-LTE limit of zero radiation temperature and atomic density. Phenomenological rate constants for SiO and CS formation in realistic astrophysical environments are expected to lie in-between these limiting cases. An analytic formula is used to fit the rate constants for convenient use in astrophysical applications.
Authors
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Robert Forrey
Penn State University
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James F Babb
ITAMP, Harvard-Smithsonian, ITAMP, Harvard-Smithsonian CfA, Harvard-Smithsonian CfA
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Phillip Stancil
University of Georgia
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Brendan McLaughlin
CTAMOP, Queen's University Belfast, Queen's University Belfast