Kinetic simulations of magnetized capacitively coupled discharges

POSTER

Abstract

Capacitive high frequency discharges are of crucial importance in the context of plasma etching, deposition and surface modification. As these single or multiple frequency discharges are oftentimes operated at low pressures of less than a few pascal, a high plasma density is commonly achieved with the use of external magnetic fields. In this work kinetic simulations are used to investigate the effect of inhomogeneous external magnetic fields on the discharge dynamics in a strongly nonlocal pressure regime. We found that capacitively coupled discharges can be largely asymmetrized by applying strong magnetic fields in front of a given target electrode. This not only has an effect on the plasma density, but also on the ion energy distribution functions (IEDF) at the electrodes and on the acceleration of fast electrons in the plasma sheath regions. In consequence in the discharge currents a generation of higher harmonics of the driving frequency can be observed. We investigate these scenarios in terms of 1D-3V Particle in Cell simulations.

Authors

  • Jan Trieschmann

    Institute for Theoretical Electrical Engineering, Ruhr-University Bochum, Ruhr University Bochum

  • Mohammed Shihab

    Ruhr University Bochum

  • Denis Eremin

    Ruhr University Bochum, Institute for Theoretical Electrical Engineering, Ruhr University Bochum, 44780 Bochum, Germany

  • Ralf Peter Brinkmann

    Theoretical Electrical Engineering, Ruhr University Bochum, Ruhr-University Bochum, Ruhr University Bochum, None, Institute for Theoretical Electrical Engineering, Ruhr University Bochum, 44780 Bochum, Germany

  • Julian Schulze

    Ruhr University Bochum, Inst. for Plasma and Atomic Physics, Ruhr-University Bochum, Ruhr-University Bochum

  • Thomas Mussenbrock

    Theoretical Electrical Engineering, Ruhr-Universitaet Bochum, Ruhr-Universit\"at Bochum, Institute for Theoretical Electrical Engineering, Ruhr-University Bochum, Ruhr University Bochum