Time-Modulated Inductively Coupled Plasmas for Advanced Dry Etching Processes

Authors

• David Coumou

  Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.