Centralized and Coherent Feedforward Impedance Tuning Control and Feedback Power Regulation for the Enhancement of RF Plasma Processing Systems

Authors

• David Coumou

  Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.