RF Models for Plasma-Surface Interactions in VSim
POSTER
Abstract
An overview of ongoing enhancements to the Plasma Discharge (PD) module of Tech-X's VSim software tool is presented. A sub-grid kinetic sheath model, developed for the accurate computation of sheath potentials near metal and dielectric-coated walls, enables the physical effects of DC and RF sheath physics to be included in macroscopic-scale plasma simulations that need not explicitly resolve sheath scale lengths. Sheath potential evolution, together with particle behavior near the sheath, can thus be simulated in complex geometries. Generalizations of the model to include sputtering, secondary electron emission, and effects from multiple ion species and background magnetic fields are summarized; related numerical results are also presented. In addition, improved tools for plasma chemistry and IEDF/EEDF visualization and modeling are discussed, as well as our initial efforts toward the development of hybrid fluid/kinetic transition capabilities within VSim. Ultimately, we aim to establish VSimPD as a robust, efficient computational tool for modeling industrial plasma processes.
Authors
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Thomas G. Jenkins
Tech-X Corporation
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D.N. Smithe
Tech-X Corporation
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A.Y. Pankin
Tech-X Corporation
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C.M. Roark
Tech-X Corporation
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C.D. Zhou
Tech-X Corporation
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P.H. Stoltz
Tech-X Corporation
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S.E. Kruger
Tech-X Corporation