Discharge-pumped XUV source.
POSTER
Abstract
We have built two experimental devices (CAPEX and CAPEX-U) working as XUV sources, which are based on the fast, pinching capillary discharge. On both these devices we have observed lasing at 46.9 nm (Ne-like Ar line). However, besides lasing at the above mentioned relatively long wavelength, they are also used for testing a possibility of amplification at the wavelengths below 20 nm that have more practical applications. Particularly, at present nitrogen-filled capillary (?4 mm x 90 mm) discharge is studied for the development of XUV (soft X-ray) laser based on recombination pumping scheme: the fully stripped nitrogen nuclei recombine to hydrogen-like atoms, where Balmer-alpha transition (wavelength 13.4 nm) is - according to theoretical predictions - capable of creating population inversion. The modified electrical parameters (peak current \textasciitilde 60 kA with quarter period of \textasciitilde 45 ns) meet the necessary theoretical conditions. The only question remains, if suitable pre-pulse can suppress the capillary-wall-ablation, which in all presently known cases has quashed the amplification. In this paper the recent results obtained from both these discharge systems (argon-, nitrogen-filled capillaries) will be presented.
Authors
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Jiri Schmidt
Institute of Plasma Physics of the CAS
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Karel Kolacek
Institute of Plasma Physics of the CAS
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Jaroslav Straus
Institute of Plasma Physics of the CAS
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Oleksandr Frolov
Institute of Plasma Physics of the CAS