Nanoparticle formation and thin film deposition in aniline containing plasmas

POSTER

Abstract

This contribution deals with plasma based polymerization processes in mixtures of argon and aniline. The investigations are performed in a capacitively coupled RF discharge (in pulsed and continuous mode) and concern both the observed formation of nanoparticles in the plasma volume and the deposition of films. The latter process was used for the deposition of ultra-thin layers on different kind of nanocarbon materials (nanotubes and free standing graphene). The analysis of the plasma and the plasma chemistry (by means of mass spectroscopy and in-situ FTIR spectroscopy) is accompanied by several ex-situ diagnostics of the obtained materials which include NEXAFS and XPS measurements as well as Raman spectroscopy and electron microscopy. The decisive point of the investigations concern the preservation of the original monomer structure during the plasma polymerization processes and the stability of the thin films on the different substrates.

Authors

  • Cedric Pattyn

    GREMI UMR 7344 CNRS&Universite d'Orleans, France

  • Ana Dias

    Instituto de Plasmas e Fusao Nuclear, Instituto Superior Tecnico, Universidade de Lisboa, Portugal, Instituto Superior Técnico, Technical University of Lisbon, Portugal

  • Shahzad Hussain

    GREMI UMR 7344 CNRS&Universite d'Orleans, France

  • Thomas Strunskus

    University of Kiel, Kiel, Germany

  • Ilija Stefanovic

    GREMI UMR 7344 CNRS&Universite d'Orleans, France

  • Chantal Boulmer-Leborgne

    GREMI UMR 7344 CNRS&Universite d'Orleans, France

  • Thomas Lecas

    GREMI UMR 7344 CNRS&Universite d'Orleans, France

  • Eva Kovacevic

    GREMI UMR 7344 CNRS&Universite d'Orleans, France, GREMI UMT 7344 CNRS&Universite d'Orleans, France

  • Johannes Berndt

    GREMI UMR 7344 CNRS&Universite d'Orleans, France, GREMI UMT 7344 CNRS&Universite d'Orleans, France