Circuit induced pulsed RF transients: impact on plasma parameters and source design considerations

ORAL

Abstract

The transient characteristics of pulse-modulated inductively coupled plasmas in argon are experimentally investigated. Time resolved measurements are made by Langmuir probe and microwave hairpin probe for a cylindrical ICP configuration driven at 13.56MHz with nominal peak power densities between 0.01 W/cm$^{\mathrm{3}}$ -- 0.1 W/cm$^{\mathrm{3}}$and nominal 1 kHz pulse frequency. Optimized conjugate match tuning to plasma impedance at a defined time after pulse initiation provides control of the initial n$_{\mathrm{e}}$ and T$_{\mathrm{e}}$ transient comparable to generator-driven pulse shaping methods at the expense of non-optimal time averaged reflected power. Source design considerations can also contribute to time dependent control of power delivery, particularly when tuning strategies such as delivered power leveling and agile frequency control are considered. Time resolved measurement of plasma parameters and power dissipation in the system are presented, demonstrating control of n$_{\mathrm{e}}$ and T$_{\mathrm{e}}$ rise times through matching network and source topology design, controlling rise time by as much as a factor of four and enabling within-pulse power delivery control.

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Authors

  • Joel Brandon

    North Carolina State University

  • Sungil Cho

    Case western Reserve University, Hokkaido University, Kyoto University, North Carolina State University, Oak Ridge National Laboratory, Saint Petersburg Mining University, Saint Petersburg, Russia, Saint Petersburg State University, Saint Petersburg, Russia, Ioffe Institute RAS, Saint Petersburg, Russia, Huazhong University of Science & Technology, Evatec AG, 9477 Truebbach, Switzerland, University of Minnesota, University of Michigan, Dept. Pulse Plasma Systems, IPP, The Czech Academy of Sciences, Czech Republic, Masaryk University, Fac. Sci., Dept. Phys. Electronics., Czech Republic, Nagoya University, Meijo University, INRS - Energie et Materiaux, University of Notre Dame, West Virginia University, Electrodynamics and Physical Electronics Group, Brandenburg University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Dalian University of Technology, Dalian, China, University of California, Berkeley, Wigner Research Centre for Physics, Hungary, Ruhr-University Bochum, Germany, Brandenburg University of Technology, Germany, Photon Science Institute, School of Physics & Astronomy, University of Manchester, Manchester M13 9PL, UK, INP Greifs\-wald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, Lawrence Livermore National Laboratory, Livermore, CA 94550, Illinois Applied Research Institute, Champaign, IL 61820, University of Illinois at Urbana Champaign, Urbana, IL 61801, Sandia National Laboratories, University of Tokyo, Los Alamos National Laboratory, Sugiyama Chemical & Industry Lab., J-Chemical, Inc., Princeton Univ / PPPL, Univ of Alberta, Univ of Saskatchewan, Texas A&M University, Drexel University, National Fusion Research Institute, Old Dominion University, University of San Francisco, Samsung Electronics Co., Chonbuk National University, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Kazan National Research Technological University, Michigan State University, Department of Astrophysical Sciences, Princeton University, Birmingham-Southern College, Tokyo Metropolitan University, Pusan National University, M.F.Stelmach’s Scientific Institute POLUS, Ghent University; Max-Planck-Institut für Plasmaphysik, Ghent University, Max-Planck-Institut für Plasmaphysik, Ghent University; LPP-ERM-KMS, TEC partner, York Plasma Insitute, University of York, Department of electrical engineering, Hanyang university, Air Force Research Laboratory, Department of Electrical Engineering, Hanyang University, The University of Shiga Prefecture, Kharkov National University, 61022, Kharkov, Svobody Sq. 4, Ukraine, Instituto de Plasmas e Fusao Nuclear, Lisboa, Portugal, Kharkov National University, Kharkov, Ukraine, BTU Cottbus-Senftenberg, Germany, FIRST, Tokyo Institute of Technology, MSL, Tokyo Institute of Technology, Plasma Technology Research Center, National Fusion Research Institute, Dalian Maritime University, Korea Electrotechnology Research Institute, AFRL, INTEPH Technologies LLC, St. Petersburg State University, Illinois Wesleyan University, University of Kentucky, Curtin University, Tsinghua University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Russia, V. N. Karazin Kharkiv National University, Tokyo Electron America, Masaryk University, Brno, Czech Republic, Semiconductor R&D Center, Samsung Electronics, ET Center, Samsung R&D Institute Japan, Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands, Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France, William & Mary, National Institute of Aerospace, VA and Bowie State University, MD, Bowie State University, MD, Eindhoven University of Technology, University of Saskatchewan, Canada, Princeton Plasma Phys Lab, Shenzhen University, Fermilab, Tech-X Corporation, Tech-X UK Ltd., Ecole Polytechnique, France, Dublin City University, Ireland, Technical University of Denmark, National Space Institute (DTU Space), Kgs. Lyngby, Denmark, LPP, CNRS, Ecole polytechnique, Palaiseau, France, INP-Greifswald, School of Physics and Optoelectronic Technology, Dalian University of Technology, China, Institute for Electrical Engineering, Ruhr-University Bochum, Germany, Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Budapest, Hungary, National Institute for Fusion Science, Hiroshima Univ., LIPHY - CNRS UMR 5588, LSPM - CNRS UPR 3407, TU Braunschweig, Institute for Surface Technology, Bienroder Weg 54, 38108 Braunschweig, Germany, INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, University of Iowa, NASA-Goddard, University of Maryland Baltimore Country, MD, and University of Colorado, CO, Drake University, Ecole Polytechnique, Samsung Electronics, University of Houston, Dalian University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany, Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany, Microwave Department, Ferdinand-Braun-Institut, Germany, Hitachi, Ltd. Research & Development Group, Sandia Natl Labs, CNRS/Polytechnique, CNRS/Université d'Orléans, Center for Bioelectrics, Old Dominion University, Department of Electrical and Computer Engineering, Old Dominion University, Center for Bioelectrics & Department of Electrical and Computer Engineering, Old Dominion University, Department of Electronic Engineering, Tohoku University, Nagoya Univ., Institute of Theoretical Electrical Engineering, Ruhr-University Bochum, Germany, Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany, Applied Materials Inc., University of York, UK, LPP-CNRS, France, Wigner Research Centre, Hungary, LPICM-CNRS, France, University of York, Synchrotron SOLEIL, LPP, Ecole Polytechnique-CNRS, Applied Materials, Inc., Ruhr-University Bochum, NFRI, Plasmapp, Seoul National University, Samsung electronics

  • Sungil Cho

    Case western Reserve University, Hokkaido University, Kyoto University, North Carolina State University, Oak Ridge National Laboratory, Saint Petersburg Mining University, Saint Petersburg, Russia, Saint Petersburg State University, Saint Petersburg, Russia, Ioffe Institute RAS, Saint Petersburg, Russia, Huazhong University of Science & Technology, Evatec AG, 9477 Truebbach, Switzerland, University of Minnesota, University of Michigan, Dept. Pulse Plasma Systems, IPP, The Czech Academy of Sciences, Czech Republic, Masaryk University, Fac. Sci., Dept. Phys. Electronics., Czech Republic, Nagoya University, Meijo University, INRS - Energie et Materiaux, University of Notre Dame, West Virginia University, Electrodynamics and Physical Electronics Group, Brandenburg University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Dalian University of Technology, Dalian, China, University of California, Berkeley, Wigner Research Centre for Physics, Hungary, Ruhr-University Bochum, Germany, Brandenburg University of Technology, Germany, Photon Science Institute, School of Physics & Astronomy, University of Manchester, Manchester M13 9PL, UK, INP Greifs\-wald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, Lawrence Livermore National Laboratory, Livermore, CA 94550, Illinois Applied Research Institute, Champaign, IL 61820, University of Illinois at Urbana Champaign, Urbana, IL 61801, Sandia National Laboratories, University of Tokyo, Los Alamos National Laboratory, Sugiyama Chemical & Industry Lab., J-Chemical, Inc., Princeton Univ / PPPL, Univ of Alberta, Univ of Saskatchewan, Texas A&M University, Drexel University, National Fusion Research Institute, Old Dominion University, University of San Francisco, Samsung Electronics Co., Chonbuk National University, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Kazan National Research Technological University, Michigan State University, Department of Astrophysical Sciences, Princeton University, Birmingham-Southern College, Tokyo Metropolitan University, Pusan National University, M.F.Stelmach’s Scientific Institute POLUS, Ghent University; Max-Planck-Institut für Plasmaphysik, Ghent University, Max-Planck-Institut für Plasmaphysik, Ghent University; LPP-ERM-KMS, TEC partner, York Plasma Insitute, University of York, Department of electrical engineering, Hanyang university, Air Force Research Laboratory, Department of Electrical Engineering, Hanyang University, The University of Shiga Prefecture, Kharkov National University, 61022, Kharkov, Svobody Sq. 4, Ukraine, Instituto de Plasmas e Fusao Nuclear, Lisboa, Portugal, Kharkov National University, Kharkov, Ukraine, BTU Cottbus-Senftenberg, Germany, FIRST, Tokyo Institute of Technology, MSL, Tokyo Institute of Technology, Plasma Technology Research Center, National Fusion Research Institute, Dalian Maritime University, Korea Electrotechnology Research Institute, AFRL, INTEPH Technologies LLC, St. Petersburg State University, Illinois Wesleyan University, University of Kentucky, Curtin University, Tsinghua University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Russia, V. N. Karazin Kharkiv National University, Tokyo Electron America, Masaryk University, Brno, Czech Republic, Semiconductor R&D Center, Samsung Electronics, ET Center, Samsung R&D Institute Japan, Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands, Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France, William & Mary, National Institute of Aerospace, VA and Bowie State University, MD, Bowie State University, MD, Eindhoven University of Technology, University of Saskatchewan, Canada, Princeton Plasma Phys Lab, Shenzhen University, Fermilab, Tech-X Corporation, Tech-X UK Ltd., Ecole Polytechnique, France, Dublin City University, Ireland, Technical University of Denmark, National Space Institute (DTU Space), Kgs. Lyngby, Denmark, LPP, CNRS, Ecole polytechnique, Palaiseau, France, INP-Greifswald, School of Physics and Optoelectronic Technology, Dalian University of Technology, China, Institute for Electrical Engineering, Ruhr-University Bochum, Germany, Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Budapest, Hungary, National Institute for Fusion Science, Hiroshima Univ., LIPHY - CNRS UMR 5588, LSPM - CNRS UPR 3407, TU Braunschweig, Institute for Surface Technology, Bienroder Weg 54, 38108 Braunschweig, Germany, INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, University of Iowa, NASA-Goddard, University of Maryland Baltimore Country, MD, and University of Colorado, CO, Drake University, Ecole Polytechnique, Samsung Electronics, University of Houston, Dalian University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany, Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany, Microwave Department, Ferdinand-Braun-Institut, Germany, Hitachi, Ltd. Research & Development Group, Sandia Natl Labs, CNRS/Polytechnique, CNRS/Université d'Orléans, Center for Bioelectrics, Old Dominion University, Department of Electrical and Computer Engineering, Old Dominion University, Center for Bioelectrics & Department of Electrical and Computer Engineering, Old Dominion University, Department of Electronic Engineering, Tohoku University, Nagoya Univ., Institute of Theoretical Electrical Engineering, Ruhr-University Bochum, Germany, Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany, Applied Materials Inc., University of York, UK, LPP-CNRS, France, Wigner Research Centre, Hungary, LPICM-CNRS, France, University of York, Synchrotron SOLEIL, LPP, Ecole Polytechnique-CNRS, Applied Materials, Inc., Ruhr-University Bochum, NFRI, Plasmapp, Seoul National University, Samsung electronics

  • Sungil Cho

    Case western Reserve University, Hokkaido University, Kyoto University, North Carolina State University, Oak Ridge National Laboratory, Saint Petersburg Mining University, Saint Petersburg, Russia, Saint Petersburg State University, Saint Petersburg, Russia, Ioffe Institute RAS, Saint Petersburg, Russia, Huazhong University of Science & Technology, Evatec AG, 9477 Truebbach, Switzerland, University of Minnesota, University of Michigan, Dept. Pulse Plasma Systems, IPP, The Czech Academy of Sciences, Czech Republic, Masaryk University, Fac. Sci., Dept. Phys. Electronics., Czech Republic, Nagoya University, Meijo University, INRS - Energie et Materiaux, University of Notre Dame, West Virginia University, Electrodynamics and Physical Electronics Group, Brandenburg University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Dalian University of Technology, Dalian, China, University of California, Berkeley, Wigner Research Centre for Physics, Hungary, Ruhr-University Bochum, Germany, Brandenburg University of Technology, Germany, Photon Science Institute, School of Physics & Astronomy, University of Manchester, Manchester M13 9PL, UK, INP Greifs\-wald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, Lawrence Livermore National Laboratory, Livermore, CA 94550, Illinois Applied Research Institute, Champaign, IL 61820, University of Illinois at Urbana Champaign, Urbana, IL 61801, Sandia National Laboratories, University of Tokyo, Los Alamos National Laboratory, Sugiyama Chemical & Industry Lab., J-Chemical, Inc., Princeton Univ / PPPL, Univ of Alberta, Univ of Saskatchewan, Texas A&M University, Drexel University, National Fusion Research Institute, Old Dominion University, University of San Francisco, Samsung Electronics Co., Chonbuk National University, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Kazan National Research Technological University, Michigan State University, Department of Astrophysical Sciences, Princeton University, Birmingham-Southern College, Tokyo Metropolitan University, Pusan National University, M.F.Stelmach’s Scientific Institute POLUS, Ghent University; Max-Planck-Institut für Plasmaphysik, Ghent University, Max-Planck-Institut für Plasmaphysik, Ghent University; LPP-ERM-KMS, TEC partner, York Plasma Insitute, University of York, Department of electrical engineering, Hanyang university, Air Force Research Laboratory, Department of Electrical Engineering, Hanyang University, The University of Shiga Prefecture, Kharkov National University, 61022, Kharkov, Svobody Sq. 4, Ukraine, Instituto de Plasmas e Fusao Nuclear, Lisboa, Portugal, Kharkov National University, Kharkov, Ukraine, BTU Cottbus-Senftenberg, Germany, FIRST, Tokyo Institute of Technology, MSL, Tokyo Institute of Technology, Plasma Technology Research Center, National Fusion Research Institute, Dalian Maritime University, Korea Electrotechnology Research Institute, AFRL, INTEPH Technologies LLC, St. Petersburg State University, Illinois Wesleyan University, University of Kentucky, Curtin University, Tsinghua University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Russia, V. N. Karazin Kharkiv National University, Tokyo Electron America, Masaryk University, Brno, Czech Republic, Semiconductor R&D Center, Samsung Electronics, ET Center, Samsung R&D Institute Japan, Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands, Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France, William & Mary, National Institute of Aerospace, VA and Bowie State University, MD, Bowie State University, MD, Eindhoven University of Technology, University of Saskatchewan, Canada, Princeton Plasma Phys Lab, Shenzhen University, Fermilab, Tech-X Corporation, Tech-X UK Ltd., Ecole Polytechnique, France, Dublin City University, Ireland, Technical University of Denmark, National Space Institute (DTU Space), Kgs. Lyngby, Denmark, LPP, CNRS, Ecole polytechnique, Palaiseau, France, INP-Greifswald, School of Physics and Optoelectronic Technology, Dalian University of Technology, China, Institute for Electrical Engineering, Ruhr-University Bochum, Germany, Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Budapest, Hungary, National Institute for Fusion Science, Hiroshima Univ., LIPHY - CNRS UMR 5588, LSPM - CNRS UPR 3407, TU Braunschweig, Institute for Surface Technology, Bienroder Weg 54, 38108 Braunschweig, Germany, INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, University of Iowa, NASA-Goddard, University of Maryland Baltimore Country, MD, and University of Colorado, CO, Drake University, Ecole Polytechnique, Samsung Electronics, University of Houston, Dalian University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany, Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany, Microwave Department, Ferdinand-Braun-Institut, Germany, Hitachi, Ltd. Research & Development Group, Sandia Natl Labs, CNRS/Polytechnique, CNRS/Université d'Orléans, Center for Bioelectrics, Old Dominion University, Department of Electrical and Computer Engineering, Old Dominion University, Center for Bioelectrics & Department of Electrical and Computer Engineering, Old Dominion University, Department of Electronic Engineering, Tohoku University, Nagoya Univ., Institute of Theoretical Electrical Engineering, Ruhr-University Bochum, Germany, Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany, Applied Materials Inc., University of York, UK, LPP-CNRS, France, Wigner Research Centre, Hungary, LPICM-CNRS, France, University of York, Synchrotron SOLEIL, LPP, Ecole Polytechnique-CNRS, Applied Materials, Inc., Ruhr-University Bochum, NFRI, Plasmapp, Seoul National University, Samsung electronics

  • Sungil Cho

    Case western Reserve University, Hokkaido University, Kyoto University, North Carolina State University, Oak Ridge National Laboratory, Saint Petersburg Mining University, Saint Petersburg, Russia, Saint Petersburg State University, Saint Petersburg, Russia, Ioffe Institute RAS, Saint Petersburg, Russia, Huazhong University of Science & Technology, Evatec AG, 9477 Truebbach, Switzerland, University of Minnesota, University of Michigan, Dept. Pulse Plasma Systems, IPP, The Czech Academy of Sciences, Czech Republic, Masaryk University, Fac. Sci., Dept. Phys. Electronics., Czech Republic, Nagoya University, Meijo University, INRS - Energie et Materiaux, University of Notre Dame, West Virginia University, Electrodynamics and Physical Electronics Group, Brandenburg University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Dalian University of Technology, Dalian, China, University of California, Berkeley, Wigner Research Centre for Physics, Hungary, Ruhr-University Bochum, Germany, Brandenburg University of Technology, Germany, Photon Science Institute, School of Physics & Astronomy, University of Manchester, Manchester M13 9PL, UK, INP Greifs\-wald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, Lawrence Livermore National Laboratory, Livermore, CA 94550, Illinois Applied Research Institute, Champaign, IL 61820, University of Illinois at Urbana Champaign, Urbana, IL 61801, Sandia National Laboratories, University of Tokyo, Los Alamos National Laboratory, Sugiyama Chemical & Industry Lab., J-Chemical, Inc., Princeton Univ / PPPL, Univ of Alberta, Univ of Saskatchewan, Texas A&M University, Drexel University, National Fusion Research Institute, Old Dominion University, University of San Francisco, Samsung Electronics Co., Chonbuk National University, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Kazan National Research Technological University, Michigan State University, Department of Astrophysical Sciences, Princeton University, Birmingham-Southern College, Tokyo Metropolitan University, Pusan National University, M.F.Stelmach’s Scientific Institute POLUS, Ghent University; Max-Planck-Institut für Plasmaphysik, Ghent University, Max-Planck-Institut für Plasmaphysik, Ghent University; LPP-ERM-KMS, TEC partner, York Plasma Insitute, University of York, Department of electrical engineering, Hanyang university, Air Force Research Laboratory, Department of Electrical Engineering, Hanyang University, The University of Shiga Prefecture, Kharkov National University, 61022, Kharkov, Svobody Sq. 4, Ukraine, Instituto de Plasmas e Fusao Nuclear, Lisboa, Portugal, Kharkov National University, Kharkov, Ukraine, BTU Cottbus-Senftenberg, Germany, FIRST, Tokyo Institute of Technology, MSL, Tokyo Institute of Technology, Plasma Technology Research Center, National Fusion Research Institute, Dalian Maritime University, Korea Electrotechnology Research Institute, AFRL, INTEPH Technologies LLC, St. Petersburg State University, Illinois Wesleyan University, University of Kentucky, Curtin University, Tsinghua University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Russia, V. N. Karazin Kharkiv National University, Tokyo Electron America, Masaryk University, Brno, Czech Republic, Semiconductor R&D Center, Samsung Electronics, ET Center, Samsung R&D Institute Japan, Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands, Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France, William & Mary, National Institute of Aerospace, VA and Bowie State University, MD, Bowie State University, MD, Eindhoven University of Technology, University of Saskatchewan, Canada, Princeton Plasma Phys Lab, Shenzhen University, Fermilab, Tech-X Corporation, Tech-X UK Ltd., Ecole Polytechnique, France, Dublin City University, Ireland, Technical University of Denmark, National Space Institute (DTU Space), Kgs. Lyngby, Denmark, LPP, CNRS, Ecole polytechnique, Palaiseau, France, INP-Greifswald, School of Physics and Optoelectronic Technology, Dalian University of Technology, China, Institute for Electrical Engineering, Ruhr-University Bochum, Germany, Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Budapest, Hungary, National Institute for Fusion Science, Hiroshima Univ., LIPHY - CNRS UMR 5588, LSPM - CNRS UPR 3407, TU Braunschweig, Institute for Surface Technology, Bienroder Weg 54, 38108 Braunschweig, Germany, INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, University of Iowa, NASA-Goddard, University of Maryland Baltimore Country, MD, and University of Colorado, CO, Drake University, Ecole Polytechnique, Samsung Electronics, University of Houston, Dalian University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany, Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany, Microwave Department, Ferdinand-Braun-Institut, Germany, Hitachi, Ltd. Research & Development Group, Sandia Natl Labs, CNRS/Polytechnique, CNRS/Université d'Orléans, Center for Bioelectrics, Old Dominion University, Department of Electrical and Computer Engineering, Old Dominion University, Center for Bioelectrics & Department of Electrical and Computer Engineering, Old Dominion University, Department of Electronic Engineering, Tohoku University, Nagoya Univ., Institute of Theoretical Electrical Engineering, Ruhr-University Bochum, Germany, Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany, Applied Materials Inc., University of York, UK, LPP-CNRS, France, Wigner Research Centre, Hungary, LPICM-CNRS, France, University of York, Synchrotron SOLEIL, LPP, Ecole Polytechnique-CNRS, Applied Materials, Inc., Ruhr-University Bochum, NFRI, Plasmapp, Seoul National University, Samsung electronics

  • Sungil Cho

    Case western Reserve University, Hokkaido University, Kyoto University, North Carolina State University, Oak Ridge National Laboratory, Saint Petersburg Mining University, Saint Petersburg, Russia, Saint Petersburg State University, Saint Petersburg, Russia, Ioffe Institute RAS, Saint Petersburg, Russia, Huazhong University of Science & Technology, Evatec AG, 9477 Truebbach, Switzerland, University of Minnesota, University of Michigan, Dept. Pulse Plasma Systems, IPP, The Czech Academy of Sciences, Czech Republic, Masaryk University, Fac. Sci., Dept. Phys. Electronics., Czech Republic, Nagoya University, Meijo University, INRS - Energie et Materiaux, University of Notre Dame, West Virginia University, Electrodynamics and Physical Electronics Group, Brandenburg University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Dalian University of Technology, Dalian, China, University of California, Berkeley, Wigner Research Centre for Physics, Hungary, Ruhr-University Bochum, Germany, Brandenburg University of Technology, Germany, Photon Science Institute, School of Physics & Astronomy, University of Manchester, Manchester M13 9PL, UK, INP Greifs\-wald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, Lawrence Livermore National Laboratory, Livermore, CA 94550, Illinois Applied Research Institute, Champaign, IL 61820, University of Illinois at Urbana Champaign, Urbana, IL 61801, Sandia National Laboratories, University of Tokyo, Los Alamos National Laboratory, Sugiyama Chemical & Industry Lab., J-Chemical, Inc., Princeton Univ / PPPL, Univ of Alberta, Univ of Saskatchewan, Texas A&M University, Drexel University, National Fusion Research Institute, Old Dominion University, University of San Francisco, Samsung Electronics Co., Chonbuk National University, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Kazan National Research Technological University, Michigan State University, Department of Astrophysical Sciences, Princeton University, Birmingham-Southern College, Tokyo Metropolitan University, Pusan National University, M.F.Stelmach’s Scientific Institute POLUS, Ghent University; Max-Planck-Institut für Plasmaphysik, Ghent University, Max-Planck-Institut für Plasmaphysik, Ghent University; LPP-ERM-KMS, TEC partner, York Plasma Insitute, University of York, Department of electrical engineering, Hanyang university, Air Force Research Laboratory, Department of Electrical Engineering, Hanyang University, The University of Shiga Prefecture, Kharkov National University, 61022, Kharkov, Svobody Sq. 4, Ukraine, Instituto de Plasmas e Fusao Nuclear, Lisboa, Portugal, Kharkov National University, Kharkov, Ukraine, BTU Cottbus-Senftenberg, Germany, FIRST, Tokyo Institute of Technology, MSL, Tokyo Institute of Technology, Plasma Technology Research Center, National Fusion Research Institute, Dalian Maritime University, Korea Electrotechnology Research Institute, AFRL, INTEPH Technologies LLC, St. Petersburg State University, Illinois Wesleyan University, University of Kentucky, Curtin University, Tsinghua University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Russia, V. N. Karazin Kharkiv National University, Tokyo Electron America, Masaryk University, Brno, Czech Republic, Semiconductor R&D Center, Samsung Electronics, ET Center, Samsung R&D Institute Japan, Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands, Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France, William & Mary, National Institute of Aerospace, VA and Bowie State University, MD, Bowie State University, MD, Eindhoven University of Technology, University of Saskatchewan, Canada, Princeton Plasma Phys Lab, Shenzhen University, Fermilab, Tech-X Corporation, Tech-X UK Ltd., Ecole Polytechnique, France, Dublin City University, Ireland, Technical University of Denmark, National Space Institute (DTU Space), Kgs. Lyngby, Denmark, LPP, CNRS, Ecole polytechnique, Palaiseau, France, INP-Greifswald, School of Physics and Optoelectronic Technology, Dalian University of Technology, China, Institute for Electrical Engineering, Ruhr-University Bochum, Germany, Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Budapest, Hungary, National Institute for Fusion Science, Hiroshima Univ., LIPHY - CNRS UMR 5588, LSPM - CNRS UPR 3407, TU Braunschweig, Institute for Surface Technology, Bienroder Weg 54, 38108 Braunschweig, Germany, INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany, University of Iowa, NASA-Goddard, University of Maryland Baltimore Country, MD, and University of Colorado, CO, Drake University, Ecole Polytechnique, Samsung Electronics, University of Houston, Dalian University of Technology, Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany, Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany, Microwave Department, Ferdinand-Braun-Institut, Germany, Hitachi, Ltd. Research & Development Group, Sandia Natl Labs, CNRS/Polytechnique, CNRS/Université d'Orléans, Center for Bioelectrics, Old Dominion University, Department of Electrical and Computer Engineering, Old Dominion University, Center for Bioelectrics & Department of Electrical and Computer Engineering, Old Dominion University, Department of Electronic Engineering, Tohoku University, Nagoya Univ., Institute of Theoretical Electrical Engineering, Ruhr-University Bochum, Germany, Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany, Applied Materials Inc., University of York, UK, LPP-CNRS, France, Wigner Research Centre, Hungary, LPICM-CNRS, France, University of York, Synchrotron SOLEIL, LPP, Ecole Polytechnique-CNRS, Applied Materials, Inc., Ruhr-University Bochum, NFRI, Plasmapp, Seoul National University, Samsung electronics