Block Copolymer Thin Films II

Presentations

• Self-assembled surface patterns from organometallic-containing triblock terpolymers

  ORAL

  March 17, 2009, 11:15 AM – March 17, 2009, 11:27 AM

  Authors

  • Vivian Chuang

    • Massachusetts Institute of Technology

  • Caroline Ross

    • MIT
    • Massachusetts Institute of Technology

  • Jessica Gwyther

    • University of Bristol

  • Ian Manners

    • University of Bristol

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• Improvement of Extraction Efficiency of LED with Surface Relief Nanotructure Fabricated by Self-Assembled Block Copolymer Pattern

  ORAL

  March 17, 2009, 11:27 AM – March 17, 2009, 11:39 AM

  Authors

  • Ryota Kitagawa

    • Corporate Research \& Development Center, Toshiba Corporation

  • Akira Fujimoto

    • Corporate Research \& Development Center, Toshiba Corporation

  • Koji Asakawa

    • Corporate Research \& Development Center, Toshiba Corporation

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• Self-Assembling Block Copolymer Resist Mixtures towards Lithographic Resists for Sub-10 nm Features

  ORAL

  March 17, 2009, 11:39 AM – March 17, 2009, 11:51 AM

  Authors

  • Curran Chandler

    • University of Massachusetts Amherst

  • Vikram Daga

    • University of Massachusetts Amherst

  • James Watkins

    • University of Massachusetts Amherst

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• Directed assembly of block copolymers on chemically nanopatterned substrates: enabling science for ultra high resolution lithography

  ORAL

  March 17, 2009, 11:51 AM – March 17, 2009, 12:03 PM

  Authors

  • Paul F. Nealey

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering, University of Wisconsin - Madison
    • University of Wisconsin
    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

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• Conditions for the directed assembly of thick block copolymer films on chemically nano-patterned surfaces

  ORAL

  March 17, 2009, 12:03 PM – March 17, 2009, 12:15 PM

  Authors

  • Adam M. Welander

    • Department of Chemical and Biological Engineering, University of Wisconsin, Madison, WI 53706

  • Paul F. Nealey

    • Department of Chemical and Biological Engineering, University of Wisconsin, Madison, WI 53706

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• Directed self-assembly of diblock copolymer thin films on chemically-patterned substrates for defect-free nano-patterning

  ORAL

  March 17, 2009, 12:15 PM – March 17, 2009, 12:27 PM

  Authors

  • Mikihito Takenaka

    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
    • Kyoto University

  • Yasuhiko Tada

    • Materials Research Laboratory, Hitachi Ltd.

  • Satoshi Akasaka

    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
    • Kyoto University

  • Synsuke Aburaya

    • Kyoto University
    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University

  • Hiroshi Yoshida

    • Materials Research Laboratory, Hitachi Ltd.

  • Hirokazu Hasegawa

    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
    • Kyoto University

  • Elizabeth Dobisz

    • San Jose Research Center, Hitachi Global Storage Technologies

  • Dan Kercher

    • San Jose Research Center, Hitachi Global Storage Technologies

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• Lamellar and Non-bulk like Morphologies in Thin Films of Block Copolymer on Chemical Nanopatterned Surfaces

  ORAL

  March 17, 2009, 12:27 PM – March 17, 2009, 12:39 PM

  Authors

  • Guoliang Liu

    • University of Wisconsin
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

  • Francois Detcheverry

    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

  • Juan J. de Pablo

    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

  • Paul F. Nealey

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering, University of Wisconsin - Madison
    • University of Wisconsin
    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

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• Self-confinement in Block Copolymer Thin Films Induced by Chemical Patterns Made from Electro-oxidation Nanolithorgraphy

  ORAL

  March 17, 2009, 12:39 PM – March 17, 2009, 12:51 PM

  Authors

  • Ji Xu

    • Dept. of Polymer Science and Engineering, University of Massachusetts Amherst

  • Antonio Checco

    • Brookhaven National Laboratory

  • Benjamin Ocko

    • Brookhaven National Laboratory

  • Soojin Park

  • Shiliu Wang

  • Thomas Russell

    • Dept. of Polymer Science and Engineering, University of Massachusetts Amherst
    • Department of Polymer Science and Engineering, University of Massachusetts-Amherst
    • University of Massachusetts
    • University of Massachusetts, Amherst
    • PSE,UMASS Amherst
    • Univ of Massachusetts Amherst
    • Univ of Massachusetts, Amherst
    • University of Massachusetts Amherst

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• Time-Resolved SAXS Characterization of Block Copolymer Blends on Chemically Nanopatterned Surfaces

  ORAL

  March 17, 2009, 12:51 PM – March 17, 2009, 1:03 PM

  Authors

  • Karl Stuen

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison
    • Univ. of Wisconsin-Madison Dept. of Chem. and Biol. Eng.

  • Paul Nealey

    • Univ. of Wisconsin-Madison Dept. of Chem. and Biol. Eng.

  • Dillip Satapathy

    • Dept. of Synchrotron Rad. and Nanotech., Paul Scherrer Institut, Switzerland

  • Kim Nygard

    • Dept. of Synchrotron Rad. and Nanotech., Paul Scherrer Institut, Switzerland

  • Harun Solak

    • Dept. of Synchrotron Rad. and Nanotech., Paul Scherrer Institut, Switzerland

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• Imaging Layer Effect on Density Multiplication in the Directed Assembly of Block Copolymer Thin Films

  ORAL

  March 17, 2009, 1:03 PM – March 17, 2009, 1:15 PM

  Authors

  • Huiman Kang

    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • University of Wisconsin

  • Eungnak Han

    • Department of Materials Science \& Engineering,University of Wisconsin-Madison
    • Department of Materials Science and Engineering, University of Wisconsin-Madison

  • Padma Gopalan

    • Department of Materials Science and Engineering, University of Wisconsin-Madison

  • Paul F. Nealey

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering, University of Wisconsin - Madison
    • University of Wisconsin
    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

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• Molecular Transfer Printing Using Block Copolymers

  ORAL

  March 17, 2009, 1:15 PM – March 17, 2009, 1:27 PM

  Authors

  • Shengxiang Ji

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison

  • Chi-Chun Liu

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison

  • Guoliang Liu

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison

  • Paul F. Nealey

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering, University of Wisconsin - Madison
    • University of Wisconsin
    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

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• Pattern interpolation in thin films of lamellar, symmetric copolymers on nano-patterned substrates

  ORAL

  March 17, 2009, 1:27 PM – March 17, 2009, 1:39 PM

  Authors

  • Francois Detcheverry

    • University of Wisconsin

  • Umang Nagpal

    • University of Wisconsin

  • Guoliang Liu

    • University of Wisconsin
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

  • Paul F. Nealey

    • Department of Chemical \& Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering, University of Wisconsin - Madison
    • University of Wisconsin
    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706

  • Juan de Pablo

    • Department of Chemical and Biological Engineering, University of Wisconsin - Madison
    • Department of Chemical and Biological Engineering, University of Wisconsin-Madison
    • University of Wisconsin
    • University of Wisconsin, Madison

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• Thin Films of Polydimethylsiloxane-Containing Block Copolymers

  ORAL

  March 17, 2009, 1:39 PM – March 17, 2009, 1:51 PM

  Authors

  • Maurice Wadley

    • The University of Akron

  • Kevin Cavicchi

    • The University of Akron
    • University of Akron

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• Interfacial Bending of Lamellar Microdomains of Block Copolymers

  ORAL

  March 17, 2009, 1:51 PM – March 17, 2009, 2:03 PM

  Authors

  • Sang-Min Park

    • IBM Almaden Research Center

  • Meng Dong

    • Department of Chemical and Biological Engineering, Colorado State

  • Charles Rettner

    • IBM Almaden Research Center

  • Qiang Wang

    • Department of Chemical and Biological Engineering, Colorado State University
    • Colorado State University
    • Department of Chemical and Biological Engineering, Colorado State

  • Ho-Cheol Kim

    • IBM Almaden Research Center

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• Observation of Surface Corrugation-Induced Alignment of Lamellar Microdomains in PS-b-PMMA Thin Films.

  ORAL

  March 17, 2009, 2:03 PM – March 17, 2009, 2:15 PM

  Authors

  • Ho-Cheol Kim

    • IBM Almaden Research Center

  • Sang-Min Park

    • IBM Almaden Research Center

  • Charles Rettner

    • IBM Almaden Research Center

  • Brian Berry

    • Department of Chemistry, University of Arkansas at Little Rock

  • Elizabeth Dobisz

    • Hitachi Global Storage Technologies

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