A study of deep level defects in β-Ga2O3 using thermal admittance spectroscopy

ORAL

Abstract

The β-Ga2O3 semiconductor is receiving great interest due to its potential applications for high power and deep-ultraviolet devices. However, in spite of a promising future of β-Ga2O3 device technology, its electronic properties, in particular deep level defects, are still not well understood. In this paper we investigated deep level defects in unintentionally doped β-Ga2O3 Schottky diodes, edge-defined film fed grown, using thermal admittance spectroscopy (TAS). An Arrhenius analysis of the TAS measurements shows two deep levels with energies of E1=0.428 eV and E2=1.07 eV and cross sections of σ1=1.83x10-13 cm2 and σ2=4.64x10-13 cm2, respectively.

Presenters

  • Mo Ahoujja

    Physics, The University of Dayton

Authors

  • J Hendricks

    Air Force Institute of Technology, Wright-Patterson AFB, OH

  • Mo Ahoujja

    Physics, The University of Dayton

  • Shin Mou

    Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH

  • Adam T Neal

    Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH