A study of deep level defects in β-Ga2O3 using thermal admittance spectroscopy
ORAL
Abstract
The β-Ga2O3 semiconductor is receiving great interest due to its potential applications for high power and deep-ultraviolet devices. However, in spite of a promising future of β-Ga2O3 device technology, its electronic properties, in particular deep level defects, are still not well understood. In this paper we investigated deep level defects in unintentionally doped β-Ga2O3 Schottky diodes, edge-defined film fed grown, using thermal admittance spectroscopy (TAS). An Arrhenius analysis of the TAS measurements shows two deep levels with energies of E1=0.428 eV and E2=1.07 eV and cross sections of σ1=1.83x10-13 cm2 and σ2=4.64x10-13 cm2, respectively.
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Presenters
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Mo Ahoujja
Physics, The University of Dayton
Authors
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J Hendricks
Air Force Institute of Technology, Wright-Patterson AFB, OH
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Mo Ahoujja
Physics, The University of Dayton
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Shin Mou
Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH
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Adam T Neal
Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson AFB, OH