Onset of tetrahedral interstitial formation in GaAsN alloys
ORAL
Abstract
Due to the dramatic bandgap reductions induced by dilute N concentrations, dilute nitride alloys are useful for near-to-mid-infrared devices. However, several studies have linked non-substitutional N incorporation to diminished absorption and emission efficiencies. Meanwhile, most computational studies have focused on the relative stabilities of substitutional nitrogen (NAs) and (N-N)As and (N-As)As split interstitials, with minimal consideration of N tetrahedral interstitials (Ntetra). To date, (N-As)As and (N-N)As have been observed via channeling NRA (NRA/c) and x-ray photoelectron spectroscopy (XPS). However, direct detection of Ntetra has not been reported. Here, we probe N incorporation mechanisms using combined experimental and computational NRA and Rutherford Backscattering spectrometry (RBS) angular yield scans. For xN< 0.025, both NAs and split interstitials are observed. However, for xN ≥ 0.025, evidence for Ntetra emerges. We discuss the possible role of interacting strain fields between N atoms as the driving force for Ntetra incorporation. This work opens opportunities for consideration of Ntetra and its influence on the properties of a variety of highly mismatched alloys.
* NSF DMR 1810280 and CINT, a DOE nanoscience user facility jointly operated by LANL and SNL
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Publication: Onset of tetrahedral interstitial formation in GaAsN alloys (In preparation)
Presenters
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Joshua Cooper
University of Michigan
Authors
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Joshua Cooper
University of Michigan
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Timothy Jen
University of Michigan, Intel Corporation
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Drew Novak
University of Michigan
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Fabian Naab
University of Michigan
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Yongqiang Wang
Los Alamos National Laboratory
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Rachel S Goldman
University of Michigan